Inventor · disambiguated record
Armin Semmler
Also filed as: SEMMLER ARMIN
4 granted patents·4 pending applications·255 citations·filing 2001–2006
80Inventor score
Files withINFINEON TECHNOLOGIES AG3INFINEON TECHNOLGIES AG1KOHLE RODERICK1MEYNE CHRISTIAN1QIMONDA AG1
Top patents by PatentIndex Score
8 records- 0195US7346885B2Method for producing a mask layout avoiding imaging errors for a maskQIMONDA AG·Filed 2005·Granted Mar 18, 2008·188 cites·49 claims
- 0287US6631511B2Generating mask layout data for simulation of lithographic processesINFINEON TECHNOLOGIES AG·Filed 2001·Granted Oct 7, 2003·48 cites·41 claims
- 0372US7011936B2Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure toolsINFINEON TECHNOLOGIES AG·Filed 2002·Granted Mar 14, 2006·13 cites·12 claims
- 0460US6756164B2Exposure mask with repaired dummy structure and method of repairing an exposure maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jun 29, 2004·6 cites·12 claims
- 0538US2006190850A1Method for optimizing the geometry of structural elements of a circuit design pattern and method for producing a photomaskKOHLE RODERICK·Filed 2006·Application pending·0 cites
- 0635US2005125764A1Method for producing a mask layout avoiding imaging errors for a maskFiled 2004·Application pending·0 cites
- 0733US2005120326A1Method for producing for a mask a mask layout which avoids aberrationsINFINEON TECHNOLGIES AG·Filed 2004·Application pending·0 cites
- 0828US2006183028A1Method for producing a mask layout avoiding imaging errors for a maskMEYNE CHRISTIAN·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →