Inventor · disambiguated record
Akinobu Horita
Also filed as: HORITA Akinobu
9 granted patents·4 pending applications·2 citations·filing 2014–2022
75Inventor score
Files withMITSUBISHI GAS CHEMICAL CO13
Top patents by PatentIndex Score
13 records- 0177US10508173B2Composition for optical material and optical material using the sameMITSUBISHI GAS CHEMICAL CO·Filed 2016·Granted Dec 17, 2019·1 cites·11 claims
- 0270US10689573B2Wet etching composition for substrate having SiN layer and Si layer and wet etching method using sameMITSUBISHI GAS CHEMICAL CO·Filed 2017·Granted Jun 23, 2020·1 cites·10 claims
- 0352US11479744B2Composition having suppressed alumina damage and production method for semiconductor substrate using sameMITSUBISHI GAS CHEMICAL CO·Filed 2019·Granted Oct 25, 2022·0 cites·18 claims
- 0452US9658365B2Optical material composition and method for producing sameMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted May 23, 2017·0 cites·8 claims
- 0548US11352593B2Aqueous composition and cleaning method using sameMITSUBISHI GAS CHEMICAL CO·Filed 2019·Granted Jun 7, 2022·0 cites·18 claims
- 0646US12338381B2Protective fluid for alumina, protection method, and production method for semiconductor substrate having alumina layer using sameMITSUBISHI GAS CHEMICAL CO·Filed 2019·Granted Jun 24, 2025·0 cites·20 claims
- 0746US11193094B2Liquid composition for reducing damage of cobalt, alumina, interlayer insulating film and silicon nitride, and washing method using sameMITSUBISHI GAS CHEMICAL CO·Filed 2018·Granted Dec 7, 2021·0 cites·10 claims
- 0845US2016202391A1Optical material composition and optical material using sameMITSUBISHI GAS CHEMICAL CO·Filed 2014·Application pending·0 cites
- 0945US2024228912A9Composition for cleaning semiconductor substrate, and cleaning methodMITSUBISHI GAS CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1044US2016003978A1Composition for optical material and optical material obtained therefromMITSUBISHI GAS CHEMICAL CO·Filed 2014·Application pending·0 cites
- 1144US2023365893A1Composition for cleaning semiconductor substrate, and cleaning methodMITSUBISHI GAS CHEMICAL CO·Filed 2021·Application pending·0 cites
- 1243US11629315B2Aqueous composition and cleaning method using sameMITSUBISHI GAS CHEMICAL CO·Filed 2019·Granted Apr 18, 2023·0 cites·14 claims
- 1341US11613720B2Aqueous composition and cleaning method using sameMITSUBISHI GAS CHEMICAL CO·Filed 2019·Granted Mar 28, 2023·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →