Inventor · disambiguated record
Scott Bukofsky
Also filed as: BUKOFSKY SCOTT · BUKOFSKY SCOTT J · BUKOFSKY SCOTT JOSEF
18 granted patents·1 pending application·789 citations·filing 1999–2006
95Inventor score
Top patents by PatentIndex Score
19 records- 0199US6993741B2Generating mask patterns for alternating phase-shift mask lithographyIBM·Filed 2003·Granted Jan 31, 2006·313 cites·14 claims
- 0298US6563566B2System and method for printing semiconductor patterns using an optimized illumination and reticleIBM·Filed 2001·Granted May 13, 2003·186 cites·43 claims
- 0396US6777147B1Method for evaluating the effects of multiple exposure processes in lithographyIBM·Filed 2003·Granted Aug 17, 2004·86 cites·20 claims
- 0489US7239371B2Density-aware dynamic leveling in scanning exposure systemsIBM·Filed 2005·Granted Jul 3, 2007·12 cites·13 claims
- 0586US6451490B1Method to overcome image shortening by use of sub-resolution reticle featuresIBM·Filed 2000·Granted Sep 17, 2002·35 cites·21 claims
- 0684US6451508B1Plural interleaved exposure process for increased feature aspect ratio in dense arraysIBM·Filed 2000·Granted Sep 17, 2002·24 cites·13 claims
- 0784US6376149B2Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophoresUNIV YALE·Filed 1999·Granted Apr 23, 2002·50 cites·15 claims
- 0880US6511791B1Multiple exposure process for formation of dense rectangular arraysIBM·Filed 2000·Granted Jan 28, 2003·19 cites·15 claims
- 0974US7354779B2Topography compensated film application methodsIBM·Filed 2006·Granted Apr 8, 2008·4 cites·15 claims
- 1071US7171034B2Method and system for phase/amplitude error detection of alternating phase shifting masks in photolithographyIBM·Filed 2002·Granted Jan 30, 2007·14 cites·16 claims
- 1170US7475380B2Generating mask patterns for alternating phase-shift mask lithographyIBM·Filed 2005·Granted Jan 6, 2009·2 cites·3 claims
- 1266US6566030B2Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophoresUNIV YALE·Filed 2001·Granted May 20, 2003·7 cites·20 claims
- 1364US7413833B2Single exposure of mask levels having a lines and spaces array using alternating phase-shift maskINFINEON TECHNOLOGIES AG·Filed 2004·Granted Aug 19, 2008·9 cites·51 claims
- 1463US7229936B2Method to reduce photoresist pattern collapse by controlled surface microrougheningIBM·Filed 2004·Granted Jun 12, 2007·8 cites·14 claims
- 1556US6824932B2Self-aligned alternating phase shift mask patterning processIBM·Filed 2002·Granted Nov 30, 2004·4 cites·4 claims
- 1654US6327023B1Optimization of reticle rotation for critical dimension and overlay improvementIBM·Filed 1999·Granted Dec 4, 2001·14 cites·11 claims
- 1749US6891169B2Electron beam array write head system and methodIBM·Filed 2003·Granted May 10, 2005·2 cites·11 claims
- 1840US2006160037A1Automated sub-field blading for leveling optimization in lithography exposure toolIBM·Filed 2005·Application pending·0 cites
- 1935US7135255B2Layout impact reduction with angled phase shapesINFINEON TECHNOLOGIES CORP·Filed 2003·Granted Nov 14, 2006·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →