Inventor · disambiguated record
Yuuji Tobisaka
Also filed as: TOBISAKA YUUJI
32 granted patents·13 pending applications·89 citations·filing 2000–2012
95Inventor score
Top patents by PatentIndex Score
45 records- 0188US7855127B2Method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2008·Granted Dec 21, 2010·12 cites·12 claims
- 0284US8088670B2Method for manufacturing bonded substrate with sandblast treatmentAKIYAMA SHOJI·Filed 2008·Granted Jan 3, 2012·9 cites·24 claims
- 0384US6546759B1Glass base material manufacturing apparatus with super imposed back-and-forth burner movementSHINETSU CHEMICAL CO·Filed 2000·Granted Apr 15, 2003·18 cites·28 claims
- 0483US8263478B2Method for manufacturing semiconductor substrateAKIYAMA SHOJI·Filed 2010·Granted Sep 11, 2012·6 cites·2 claims
- 0576US7977209B2Method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 12, 2011·4 cites·9 claims
- 0675US8021910B2Method for producing single crystal silicon solar cell and single crystal silicon solar cellSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 20, 2011·2 cites·18 claims
- 0771US8119903B2Method of manufacturing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2007·Granted Feb 21, 2012·2 cites·18 claims
- 0869US7892934B2SOI substrate and method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 22, 2011·4 cites·10 claims
- 0967US8765576B2Process for producing laminated substrate and laminated substrateAKIYAMA SHOJI·Filed 2009·Granted Jul 1, 2014·2 cites·16 claims
- 1066US6698240B1Apparatus for manufacturing glass base material and a method for manufacturing glass base materialSHINETSU CHEMICAL CO·Filed 2000·Granted Mar 2, 2004·4 cites·36 claims
- 1164US7799589B2Optical waveguide apparatus and method for manufacturing the sameSHINETSU CHEMICAL CO·Filed 2008·Granted Sep 21, 2010·8 cites·8 claims
- 1264US7732867B2Method for manufacturing SOQ substrateSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 8, 2010·1 cites·5 claims
- 1363US8106290B2Method for manufacturing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2008·Granted Jan 31, 2012·2 cites·15 claims
- 1463US7615456B2Method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2008·Granted Nov 10, 2009·2 cites·12 claims
- 1562US7972937B2Method for producing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2008·Granted Jul 5, 2011·2 cites·4 claims
- 1662US7833878B2Method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2007·Granted Nov 16, 2010·2 cites·4 claims
- 1762US7696059B2Method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2008·Granted Apr 13, 2010·1 cites·16 claims
- 1861US7213416B2Glass base material producing deviceSHINETSU CHEMICAL CO·Filed 2001·Granted May 8, 2007·2 cites·34 claims
- 1960US7823418B2Method of making glass base materialSHINETSU CHEMICAL CO·Filed 2006·Granted Nov 2, 2010·0 cites·11 claims
- 2058US8268700B2Method for manufacturing SOI waferAKIYAMA SHOJI·Filed 2008·Granted Sep 18, 2012·1 cites·2 claims
- 2158US7935611B2Method for manufacturing substrate for photoelectric conversion elementSHINETSU CHEMICAL CO·Filed 2007·Granted May 3, 2011·1 cites·16 claims
- 2257US2011290321A1Method for producing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2011·Application pending·0 cites
- 2357US2011290320A1Method for producing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2011·Application pending·0 cites
- 2456US7055345B2Glass base material manufacturing apparatus and glass base material manufacturing methodTOBISAKA YUUJI·Filed 2003·Granted Jun 6, 2006·3 cites·22 claims
- 2554US6672112B2OVD apparatus including air-regulating structureSHINETSU CHEMICAL CO·Filed 2003·Granted Jan 6, 2004·1 cites·21 claims
- 2653US8129612B2Method for manufacturing single-crystal silicon solar cell and single-crystal silicon solar cellITO ATSUO·Filed 2008·Granted Mar 6, 2012·0 cites·9 claims
- 2753US8030118B2Method for producing single crystal silicon solar cell and single crystal silicon solar cellSHINETSU CHEMICAL CO·Filed 2007·Granted Oct 4, 2011·0 cites·10 claims
- 2853US2010233866A1Method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 2952US8227290B2Method for producing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2007·Granted Jul 24, 2012·0 cites·2 claims
- 3052US8227289B2Method for producing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2007·Granted Jul 24, 2012·0 cites·4 claims
- 3150US2011244654A1Method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2011·Application pending·0 cites
- 3250US2008113489A1Method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 3349US7691724B2Method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2008·Granted Apr 6, 2010·0 cites·12 claims
- 3449US2011111574A1Method for manufacturing semiconductor substrateSHINETSU CHEMICAL CO·Filed 2011·Application pending·0 cites
- 3549US2009057791A1Microchip and soi substrate for manufacturing microchipSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 3648US9064929B2Method for reducing the thickness of an SOI layerAKIYAMA SHOJI·Filed 2008·Granted Jun 23, 2015·0 cites·4 claims
- 3748US7879175B2Method for manufacturing pyrolytic boron nitride composite substrateSHINETSU CHEMICAL CO·Filed 2008·Granted Feb 1, 2011·0 cites·4 claims
- 3848US2012228730A1Microchip and soi substrate for manufacturing microchipAKIYAMA SHOJI·Filed 2012·Application pending·0 cites
- 3947US7790571B2SOQ substrate and method of manufacturing SOQ substrateSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 7, 2010·0 cites·21 claims
- 4047US2012118354A1Method for manufacturing single crystal silicon solar cell and single crystal silicon solar cellITO ATSUO·Filed 2011·Application pending·0 cites
- 4147US2011111575A1Method for manufacturing soi substrateSHINETSU CHEMICAL CO·Filed 2011·Application pending·0 cites
- 4245US2008153272A1Method for manufacturing SOI substrateSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 4344US2010289115A1Soi substrate and method for manufacturing soi substrateSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 4441US7595866B2Method for measuring non-circularity at core portion of optical fiber parent materialSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 29, 2009·0 cites·10 claims
- 4541US2007169515A1Processing method and processing apparatus of glass base material for optical fiberTOBISAKA YUUJI·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →