Inventor · disambiguated record
Wilfried Clauss
Also filed as: CLAUSS WILFRIED
16 granted patents·4 pending applications·19 citations·filing 2003–2014
88Inventor score
Top patents by PatentIndex Score
20 records- 0181US8870396B2Substrates for mirrors for EUV lithography and their productionZEISS CARL SMT GMBH·Filed 2012·Granted Oct 28, 2014·5 cites·19 claims
- 0267US7907347B2Optical composite material and method for its productionZEISS CARL SMT AG·Filed 2006·Granted Mar 15, 2011·2 cites·24 claims
- 0366US9263161B2Optical arrangement for EUV lithography and method for configuring such an optical arrangementCLAUSS WILFRIED·Filed 2012·Granted Feb 16, 2016·2 cites·18 claims
- 0465US7679721B2Projection objective of a microlithographic projection exposure apparatus and method for its productionZEISS CARL SMT AG·Filed 2006·Granted Mar 16, 2010·2 cites·27 claims
- 0564US8031326B2Illumination system or projection lens of a microlithographic exposure systemZEISS CARL SMT GMBH·Filed 2008·Granted Oct 4, 2011·3 cites·35 claims
- 0663US8964162B2Optical assemblyFIOLKA DAMIAN·Filed 2011·Granted Feb 24, 2015·1 cites·42 claims
- 0762US9238590B2Mirror elements for EUV lithography and production methods thereforZEISS CARL SMT GMBH·Filed 2014·Granted Jan 19, 2016·0 cites·16 claims
- 0862US8163667B2Transmitting optical element with low foreign-element contaminationCLAUSS WILFRIED·Filed 2009·Granted Apr 24, 2012·1 cites·30 claims
- 0957US7982969B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2008·Granted Jul 19, 2011·1 cites·47 claims
- 1052US9459538B2Lithography apparatus and method for producing a mirror arrangementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 4, 2016·0 cites·26 claims
- 1152US6914248B2Particle-optical apparatus and method for operating the sameZEISS CARL NTS GMBH·Filed 2003·Granted Jul 5, 2005·2 cites·22 claims
- 1251US8325426B2Projection objective of a microlithographic projection exposure apparatusSCHUSTER KARL-HEINZ·Filed 2011·Granted Dec 4, 2012·0 cites·24 claims
- 1350US8711332B2Mirror elements for EUV lithography and production methods thereforCLAUSS WILFRIED·Filed 2012·Granted Apr 29, 2014·0 cites·6 claims
- 1448US2008170229A1Method of selecting crystalline quartz material for use in an optical apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1547US2009021830A1Projection lens of a microlithographic exposure systemZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1644US8570488B2Transmitting optical element and objective for a microlithographic projection exposure apparatusCLAUSS WILFRIED·Filed 2005·Granted Oct 29, 2013·0 cites·35 claims
- 1744US7755839B2Microlithography projection objective with crystal lensZEISS CARL SMT AG·Filed 2004·Granted Jul 13, 2010·0 cites·14 claims
- 1844US2014307308A1Reflective Optical Element for the EUV Wavelength Range, Method for Producing and for Correcting Such an Element, Projection Lens for Microlithography Comprising Such an Element, and Projection Exposure Apparatus for Microlithography Comprising Such a Projection LensZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1939US2012212721A1Substrates and mirrors for euv microlithography, and methods for producing themCLAUSS WILFRIED·Filed 2012·Application pending·0 cites
- 2037US9494718B2Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objectiveMUELLENDER STEPHAN·Filed 2012·Granted Nov 15, 2016·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →