Inventor · disambiguated record
Morio Hosoya
Also filed as: HOSOYA MORIO
16 granted patents·4 pending applications·106 citations·filing 2001–2013
92Inventor score
Top patents by PatentIndex Score
20 records- 0191US7390596B2Reflection type mask blank and reflection type mask and production methods for themHOYA CORP·Filed 2003·Granted Jun 24, 2008·42 cites·38 claims
- 0285US7981573B2Reflective mask blank, reflective mask and methods of producing the mask blank and the maskHOYA CORP·Filed 2008·Granted Jul 19, 2011·7 cites·10 claims
- 0384US9229315B2Reflective mask blank and method of manufacturing a reflective maskHOYA CORP·Filed 2013·Granted Jan 5, 2016·3 cites·18 claims
- 0484US8329361B2Reflective mask blank, method of manufacturing a reflective mask blank and method of manufacturing a reflective maskHOSOYA MORIO·Filed 2010·Granted Dec 11, 2012·4 cites·12 claims
- 0581US8546047B2Reflective mask blank and method of manufacturing a reflective maskHOSOYA MORIO·Filed 2009·Granted Oct 1, 2013·7 cites·13 claims
- 0675US6737201B2Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor deviceHOYA CORP·Filed 2001·Granted May 18, 2004·14 cites·15 claims
- 0772US6749973B2Reflection type mask blank for EUV exposure and reflection type mask for EUV exposure as well as method of producing the maskHOYA CORP·Filed 2002·Granted Jun 15, 2004·14 cites·11 claims
- 0870US7056627B2Method of manufacturing a reflection type mask blank and method of manufacturing a reflection type maskHOYA CORP·Filed 2003·Granted Jun 6, 2006·10 cites·11 claims
- 0969US8709685B2Reflective mask blank and method of manufacturing a reflective maskHOYA CORP·Filed 2012·Granted Apr 29, 2014·1 cites·9 claims
- 1063US8021807B2Reflective mask blank and method of producing the same, and method of producing a reflective maskHOYA CORP·Filed 2009·Granted Sep 20, 2011·1 cites·18 claims
- 1162US7804648B2Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective maskHOYA CORP·Filed 2006·Granted Sep 28, 2010·3 cites·14 claims
- 1258US8512916B2Photomask blank, photomask, and method for manufacturing photomask blankIWASHITA HIROYUKI·Filed 2009·Granted Aug 20, 2013·0 cites·8 claims
- 1357US9075314B2Photomask blank, photomask, and method for manufacturing photomask blankHOYA CORP·Filed 2013·Granted Jul 7, 2015·0 cites·23 claims
- 1449US2010084375A1Method of producing a reflective maskHOYA CORP·Filed 2009·Application pending·0 cites
- 1546US7700245B2Reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2006·Granted Apr 20, 2010·0 cites·9 claims
- 1646US2005238922A1Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing themHOYA CORP·Filed 2004·Application pending·0 cites
- 1742US2006237303A1Sputtering target, method of manufacturing a multilayer reflective film coated substrate, method of manufacturing a reflective mask blank, and method of manufacturing a reflective maskHOYA CORP·Filed 2006·Application pending·0 cites
- 1841US2006270226A1Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2006·Application pending·0 cites
- 1939US8081384B2Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective maskHOSOYA MORIO·Filed 2006·Granted Dec 20, 2011·0 cites·8 claims
- 2038US8389184B2Reflective mask blank and method of manufacturing a reflective maskHOSOYA MORIO·Filed 2010·Granted Mar 5, 2013·0 cites·8 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →