Inventor · disambiguated record
Paul Mertens
Also filed as: HEYNS MARC · KRECHER JOSEF · MERTENS PAUL · MERTENS PAUL W
34 granted patents·9 pending applications·1,339 citations·filing 1977–2017
98Inventor score
Top patents by PatentIndex Score
43 records- 0197US6398975B1Method and apparatus for localized liquid treatment of the surface of a substrateIMEC INTER UNI MICRO ELECTR·Filed 2000·Granted Jun 4, 2002·169 cites·21 claims
- 0294US6491764B2Method and apparatus for removing a liquid from a surface of a rotating substrateIMEC INTER UNI MICRO ELECTR·Filed 1998·Granted Dec 10, 2002·196 cites·51 claims
- 0394US6387827B1Method for growing thin silicon oxides on a silicon substrate using chlorine precursorsIMEC VZW·Filed 1997·Granted May 14, 2002·348 cites·15 claims
- 0493US6851435B2Method and apparatus for localized liquid treatment of the surface of a substrateIMEC INTER UNI MICRO ELECTR·Filed 2002·Granted Feb 8, 2005·66 cites·27 claims
- 0590US6334902B1Method and apparatus for removing a liquid from a surfaceIMEC INTER UNI MICRO ELECTR·Filed 1998·Granted Jan 1, 2002·93 cites·13 claims
- 0689US6568408B2Method and apparatus for removing a liquid from a surface of a rotating substrateIMEC INTER UNI MICRO ELECTR·Filed 2002·Granted May 27, 2003·43 cites·30 claims
- 0788US6754980B2Megasonic cleaner and dryerGOLDFINGER TECHNOLOGIES LLC·Filed 2002·Granted Jun 29, 2004·48 cites·36 claims
- 0886US6472294B2Semiconductor processing method for processing discrete pieces of substrate to form electronic devicesIMEC VZW·Filed 2001·Granted Oct 29, 2002·32 cites·15 claims
- 0982US6551409B1Method for removing organic contaminants from a semiconductor surfaceIMEC INTER UNI MICRO ELECTR·Filed 1998·Granted Apr 22, 2003·72 cites·32 claims
- 1081US6863795B2Multi-step method for metal depositionIMEC INTER UNI MICRO ELECTR·Filed 2002·Granted Mar 8, 2005·28 cites·19 claims
- 1179US6530385B2Apparatus and method for wet cleaning or etching a flat substrateIMEC INTER UNI MICRO ELECTR·Filed 2000·Granted Mar 11, 2003·18 cites·20 claims
- 1278US6632751B2Method and apparatus for liquid-treating and drying a substrateINTERUNIVERSITAIR MICROELEKRON·Filed 2001·Granted Oct 14, 2003·24 cites·26 claims
- 1376US6322598B1Semiconductor processing system for processing discrete pieces of substrate to form electronic devicesIMEC VZW·Filed 1999·Granted Nov 27, 2001·41 cites·6 claims
- 1472US6928751B2Megasonic cleaner and dryer systemIMEC INTER UNI MICRO ELECTR·Filed 2002·Granted Aug 16, 2005·14 cites·21 claims
- 1572US6821349B2Method and apparatus for removing a liquid from a surfaceIMEC INTER UNI MICRO ELECTR·Filed 2001·Granted Nov 23, 2004·13 cites·14 claims
- 1670US7224433B2Method and apparatus for immersion lithographyIMEC INTER UNI MICRO ELECTR·Filed 2005·Granted May 29, 2007·4 cites·21 claims
- 1770US7100304B2Megasonic cleaner and dryerAKRION TECHNOLOGIES INC·Filed 2004·Granted Sep 5, 2006·15 cites·9 claims
- 1867US7521408B2Semiconductor cleaning solutionIMEC INTER UNI MICRO ELECTR·Filed 2005·Granted Apr 21, 2009·3 cites·22 claims
- 1967US6910487B2Method and apparatus for liquid-treating and drying a substrateIMEC VZW·Filed 2003·Granted Jun 28, 2005·9 cites·17 claims
- 2062US7160482B2Composition comprising an oxidizing and complexing compoundAIR PROD & CHEM·Filed 2001·Granted Jan 9, 2007·8 cites·27 claims
- 2160US8324116B2Substrate treating method and method of manufacturing semiconductor device using the sameVOS RITA·Filed 2010·Granted Dec 4, 2012·2 cites·3 claims
- 2260US7527698B2Method and apparatus for removing a liquid from a surface of a substrateIMEC INTER UNI MICRO ELECTR·Filed 2003·Granted May 5, 2009·7 cites·22 claims
- 2360US5712168AMethod for evaluating, monitoring or controlling the efficiency, stability, or exhaustion of a complexing or chelating agent present in a chemical solution used for oxidizing, dissolving, etching or stripping a semiconductor waferIMEC·Filed 1995·Granted Jan 27, 1998·23 cites·12 claims
- 2459US6676765B2Method of removing particles and a liquid from a surface of substrateIMEC INTER UNI MICRO ELECTR·Filed 2001·Granted Jan 13, 2004·6 cites·34 claims
- 2559US6261377B1Method of removing particles and a liquid from a surface of substrateIMEC INTER UNI MICRO ELECTR·Filed 1998·Granted Jul 17, 2001·21 cites·25 claims
- 2650US6303522B1Oxidation in an ambient comprising ozone and the reaction products of an organic chloro-carbon precursorIMEC VZW·Filed 1998·Granted Oct 16, 2001·15 cites·17 claims
- 2747US2009223832A1Method and Apparatus for Preventing Galvanic Corrosion in Semiconductor ProcessingIMEC INTER UNI MICRO ELECTR·Filed 2009·Application pending·0 cites
- 2845US2017076936A1Method and Apparatus for Cleaning a Semiconductor SubstrateIMEC·Filed 2016·Application pending·0 cites
- 2944US6247481B1Apparatus and method for wet cleaning or etching a flat substrateIMEC INTER UNI MICRO ELECTR·Filed 1997·Granted Jun 19, 2001·8 cites·28 claims
- 3043US9673373B2System for delivering ultrasonic energy to a liquid and use for cleaning of solid partsIMEC·Filed 2013·Granted Jun 6, 2017·0 cites·16 claims
- 3143US2011088719A1Method and Apparatus for Cleaning a Semiconductor SubstrateIMEC·Filed 2010·Application pending·0 cites
- 3242US2003145878A1Apparatus and method for wet cleaning or etching a flat substrateIMEC VZW·Filed 2003·Application pending·0 cites
- 3340US7867565B2Method for coating substratesIMEC·Filed 2004·Granted Jan 11, 2011·0 cites·13 claims
- 3440US6592676B1Chemical solution and method for reducing the metal contamination on the surface of a semiconductor substrateIMEC INTER UNI MICRO ELECTR·Filed 1999·Granted Jul 15, 2003·9 cites·7 claims
- 3540US2004231188A1Megasonic cleaner and dryerFiled 2004·Application pending·0 cites
- 3639US2012227775A1Method and Apparatus for Controlling Optimal Operation of Acoustic CleaningBREMS STEVEN·Filed 2012·Application pending·0 cites
- 3739US2018047560A1Method for Performing a Wet Treatment of a SubstrateIMEC VZW·Filed 2017·Application pending·0 cites
- 3837US8197604B2Method and apparatus for controlling optimal operation of acoustic cleaningBREMS STEVEN·Filed 2010·Granted Jun 12, 2012·0 cites·12 claims
- 3930US9378989B2Method and apparatus for cleaning semiconductor substratesMERTENS PAUL·Filed 2012·Granted Jun 28, 2016·0 cites·20 claims
- 4030US4161293ABlower beater millBABCOCK AG·Filed 1977·Granted Jul 17, 1979·3 cites·7 claims
- 4128US4161295ABlower beater millBABCOCK AG·Filed 1977·Granted Jul 17, 1979·1 cites·10 claims
- 4228US2010224215A1Method for Reducing the Damage Induced by a Physical Force Assisted CleaningIMEC·Filed 2010·Application pending·0 cites
- 4327US2002011257A1Method for removing organic contaminants from a semiconductor surfaceFiled 1998·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →