Inventor · disambiguated record
Aritaka Hishida
Also filed as: HISHIDA ARITAKA
8 granted patents·2 pending applications·225 citations·filing 1999–2020
86Inventor score
Files withAZ ELECTRONIC MATERIALS USA3MERCK PATENT GMBH2AZ ELECTRONIC MAT LUXEMBOURG SARL1CLARIANT INT LTD1LIU WEIHONG1
Top patents by PatentIndex Score
10 records- 0196US7824837B2Positive-working photoimageable bottom antireflective coatingAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Nov 2, 2010·54 cites·22 claims
- 0294US7691556B2Antireflective compositions for photoresistsAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Apr 6, 2010·29 cites·27 claims
- 0391US6358665B1Radiation-sensitive composition of chemical amplification typeCLARIANT INT LTD·Filed 1999·Granted Mar 19, 2002·125 cites·42 claims
- 0488US8039202B2Positive-working photoimageable bottom antireflective coatingAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Oct 18, 2011·11 cites·19 claims
- 0584US8841062B2Positive working photosensitive materialLIU WEIHONG·Filed 2012·Granted Sep 23, 2014·6 cites·20 claims
- 0648US10976662B2Positive working photosensitive materialAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Apr 13, 2021·0 cites·38 claims
- 0741US11698586B2Negative-working ultra thick film photoresistMERCK PATENT GMBH·Filed 2019·Granted Jul 11, 2023·0 cites·22 claims
- 0839US2005214674A1Positive-working photoimageable bottom antireflective coatingSUI YU·Filed 2004·Application pending·0 cites
- 0938US12441822B2Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor compositionMERCK PATENT GMBH·Filed 2020·Granted Oct 14, 2025·0 cites·15 claims
- 1038US2006057501A1Antireflective compositions for photoresistsWU HENGPENG·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →