Inventor · disambiguated record
Vladimir Davydenko
Also filed as: DAVYDENKO VLADIMIR · DAVYDENKO VLADIMIR I
27 granted patents·7 pending applications·170 citations·filing 2000–2022
95Inventor score
Files withZEISS CARL SMT GMBH13Scantinel Photonics GmbH6TAE TECH INC4ZEISS CARL AG3TRI ALPHA ENERGY INC2
Top patents by PatentIndex Score
34 records- 0194US9591740B2Negative ion-based neutral beam injectorTRI ALPHA ENERGY INC·Filed 2015·Granted Mar 7, 2017·40 cites·24 claims
- 0293US11009593B1Device and method for scanning measurement of the distance to an objectScantinel Photonics GmbH·Filed 2020·Granted May 18, 2021·4 cites·13 claims
- 0393US9924587B2Negative ion-based neutral beam injectorTRI ALPHA ENERGY INC·Filed 2017·Granted Mar 20, 2018·17 cites·22 claims
- 0490US11363708B2Negative ion-based beam injectorTAE TECH INC·Filed 2020·Granted Jun 14, 2022·2 cites·20 claims
- 0589US7995280B2Projection exposure system, beam delivery system and method of generating a beam of lightZEISS CARL SMT GMBH·Filed 2005·Granted Aug 9, 2011·14 cites·9 claims
- 0689US6433934B1Illumination system for use in imaging systemsFiled 2000·Granted Aug 13, 2002·64 cites·26 claims
- 0785US10398016B2Negative ion-based beam injectorTAE TECH INC·Filed 2018·Granted Aug 27, 2019·3 cites·23 claims
- 0884US10887976B2Negative ion-based beam injectorTAE TECH INC·Filed 2019·Granted Jan 5, 2021·3 cites·15 claims
- 0984US9280060B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2014·Granted Mar 8, 2016·5 cites·28 claims
- 1083US9910360B2Lighting system of a microlithographic projection exposure system and method for operating such a lighting systemZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·2 cites·15 claims
- 1183US9500954B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Nov 22, 2016·3 cites·21 claims
- 1282US8004656B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2006·Granted Aug 23, 2011·5 cites·18 claims
- 1378US8873023B2Illumination system for microlithographySCHOLZ AXEL·Filed 2011·Granted Oct 28, 2014·4 cites·12 claims
- 1471US9535210B2Optical hollow waveguide assemblyZEISS CARL SMT GMBH·Filed 2016·Granted Jan 3, 2017·2 cites·20 claims
- 1571US9310690B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 12, 2016·1 cites·21 claims
- 1670US9606441B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Mar 28, 2017·1 cites·20 claims
- 1766US11237254B2Device and method for scanning measurement of the distance to an objectScantinel Photonics GmbH·Filed 2021·Granted Feb 1, 2022·0 cites·23 claims
- 1859US10274828B2Lighting system of a microlithographic projection exposure system and method for operating such a lighting systemZEISS CARL SMT GMBH·Filed 2018·Granted Apr 30, 2019·0 cites·20 claims
- 1958US12377877B2Device and method for scanning measurement of the distance to an objectScantinel Photonics GmbH·Filed 2021·Granted Aug 5, 2025·0 cites·20 claims
- 2058US12372622B2Apparatus and method for scanning ascertainment of the distance to an objectZEISS CARL AG·Filed 2021·Granted Jul 29, 2025·0 cites·12 claims
- 2157US10088754B2Illumination system for microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Oct 2, 2018·0 cites·19 claims
- 2257US2023176214A1Device for Scanning Frequency-Modulated Continuous Wave (FMCW) LiDAR Range MeasurementScantinel Photonics GmbH·Filed 2022·Application pending·0 cites
- 2356US9910359B2Illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 6, 2018·0 cites·27 claims
- 2456US2022334225A1Light Source for Frequency-Modulated Continuous Wave (FMCW) LiDAR DeviceScantinel Photonics GmbH·Filed 2021·Application pending·0 cites
- 2555US12127325B2Systems, devices, and methods for secondary particle suppression from a charge exchange deviceTAE TECH INC·Filed 2021·Granted Oct 22, 2024·0 cites·14 claims
- 2652US8730455B2Illumination system for a microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2011·Granted May 20, 2014·0 cites·10 claims
- 2751US2021026015A1Apparatus for ascertaining a distance to an objectZEISS CARL AG·Filed 2020·Application pending·0 cites
- 2848US12111396B2Device and method for scanning frequency-modulated continuous wave (FMCW) LiDAR range measurementScantinel Photonics GmbH·Filed 2022·Granted Oct 8, 2024·0 cites·8 claims
- 2948US10539883B2Illumination system of a microlithographic projection device and method for operating such a systemZEISS CARL SMT GMBH·Filed 2018·Granted Jan 21, 2020·0 cites·20 claims
- 3046US2012013878A1Projection Exposure System, Beam Delivery System and Method of Generating a Beam of LightKUSS MATTHIAS·Filed 2011·Application pending·0 cites
- 3146US2021026017A1Apparatus for ascertaining a distance to an objectZEISS CARL AG·Filed 2020·Application pending·0 cites
- 3244US9977334B2Lighting system of a microlithographic projection exposure system and method for operating such a lighting systemZEISS CARL SMT GMBH·Filed 2016·Granted May 22, 2018·0 cites·17 claims
- 3337US2002114082A1Irradiation system for generating modulated radiationFiled 2001·Application pending·0 cites
- 3437US2002054435A1Arrangement and device for transforming optical raysFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →