Inventor · disambiguated record
Chan-Uk Jeon
Also filed as: JEON CHAN-UK
12 granted patents·11 citations·filing 2006–2015
84Inventor score
Top patents by PatentIndex Score
12 records- 0178US8404405B2Pellicle frame, pellicle, lithography apparatus, and method of fabricating the pellicle frameKIM JUNG-JIN·Filed 2010·Granted Mar 26, 2013·3 cites·11 claims
- 0275US8414708B2Method and apparatus for cleaning photomaskJEONG YUN-SONG·Filed 2010·Granted Apr 9, 2013·4 cites·14 claims
- 0366US7601467B2Method of manufacturing EUVL alternating phase-shift maskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 13, 2009·2 cites·18 claims
- 0465US9122177B2Apparatus for cleaning photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Sep 1, 2015·1 cites·17 claims
- 0563US9798241B2Methods of manufacturing photomasks, methods of forming photoresist patterns and methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Oct 24, 2017·1 cites·17 claims
- 0663US9436077B2Method of fabricating a pellicle frameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Sep 6, 2016·0 cites·6 claims
- 0744US7812929B2Electrostatic chuck with temperature sensing unit, exposure equipment having the same, and method of detecting temperature from photomaskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 12, 2010·0 cites·21 claims
- 0843US7632611B2Method of manufacturing rim type of photomask and photomask made by such methodSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Dec 15, 2009·0 cites·19 claims
- 0942US9370805B2Method of megasonic cleaning of an objectCHOI JAE-HYUCK·Filed 2012·Granted Jun 21, 2016·0 cites·13 claims
- 1039US8293020B2Method of megasonic cleaning of an objectCHOI JAE-HYUCK·Filed 2010·Granted Oct 23, 2012·0 cites·9 claims
- 1138US8522172B2Method of forming photomask using calibration pattern, and photomask having calibration patternYOON YOUNG-KEUN·Filed 2011·Granted Aug 27, 2013·0 cites·20 claims
- 1236US8784672B2Photomasks and methods of manufacturing the sameOH JONG-KEUN·Filed 2011·Granted Jul 22, 2014·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →