Inventor · disambiguated record
Guenther Dengel
Also filed as: DENGEL GUENTHER
7 granted patents·5 pending applications·10 citations·filing 2007–2015
74Inventor score
Top patents by PatentIndex Score
12 records- 0183US9041905B2Optical arrangement, in particular in a projection exposure apparatus for EUV lithographyEHM DIRK HEINRICH·Filed 2012·Granted May 26, 2015·4 cites·28 claims
- 0279US7858957B2Illumination optics for projection microlithographyZEISS CARL SMT AG·Filed 2007·Granted Dec 28, 2010·6 cites·25 claims
- 0361US2010007866A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 0458US9671584B2Method and cooling system for cooling an optical element for EUV applicationsZEISS CARL SMT GMBH·Filed 2014·Granted Jun 6, 2017·0 cites·20 claims
- 0551US7990520B2Microlithography illumination systems, components and methodsZEISS CARL SMT GMBH·Filed 2007·Granted Aug 2, 2011·0 cites·14 claims
- 0651US2013100426A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Application pending·0 cites
- 0746US8643825B2Microlithography illumination systems, components and methodsWARM BERNDT·Filed 2011·Granted Feb 4, 2014·0 cites·19 claims
- 0842US2009002670A1Apparatus for the manipulation and/or adjustment of an optical elementZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 0939US8831170B2Mirror with a mirror carrier and projection exposure apparatusWEVERS RUTGER·Filed 2007·Granted Sep 9, 2014·0 cites·31 claims
- 1038US2008266686A1Facet mirror comprising a multiplicity of mirror segmentsZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 1136US2011235015A1Illumination optics for euv microlithographyCarl Zeiss GmbH·Filed 2011·Application pending·0 cites
- 1230US9684243B2Blocking element for protecting optical elements in projection exposure apparatusesZEISS CARL SMT GMBH·Filed 2015·Granted Jun 20, 2017·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →