Inventor · disambiguated record
Gerrit Johannes Nijmeijer
Also filed as: NIJMEIJER GERRIT J · NIJMEIJER GERRIT JOHANNES
22 granted patents·1 pending application·391 citations·filing 2000–2020
95Inventor score
Top patents by PatentIndex Score
23 records- 0196US6674510B1Off-axis levelling in lithographic projection apparatusASML NETHERLANDS BV·Filed 2000·Granted Jan 6, 2004·192 cites·95 claims
- 0295US7206058B2Off-axis levelling in lithographic projection apparatusASML NETHERLANDS BV·Filed 2006·Granted Apr 17, 2007·20 cites·14 claims
- 0393US7352440B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·37 cites·18 claims
- 0491US7116401B2Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Oct 3, 2006·49 cites·30 claims
- 0588US11971665B2Wafer alignment using form birefringence of targets or productASML HOLDING NV·Filed 2020·Granted Apr 30, 2024·2 cites·16 claims
- 0687US9182222B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2012·Granted Nov 10, 2015·3 cites·53 claims
- 0786US8441617B2Substrate placement in immersion lithographyHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2011·Granted May 14, 2013·3 cites·12 claims
- 0884US7019815B2Off-axis leveling in lithographic projection apparatusASML NETHERLANDS BV·Filed 2004·Granted Mar 28, 2006·19 cites·11 claims
- 0982US9551939B2Mark position measuring apparatus and method, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Jan 24, 2017·6 cites·20 claims
- 1081US6882405B2Off-axis levelling in lithographic projection apparatusASML NETHERLANDS BV·Filed 2003·Granted Apr 19, 2005·13 cites·10 claims
- 1179US8077291B2Substrate placement in immersion lithographyHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2007·Granted Dec 13, 2011·3 cites·14 claims
- 1278US6924884B2Off-axis leveling in lithographic projection apparatusASML NETHERLANDS BV·Filed 2003·Granted Aug 2, 2005·23 cites·60 claims
- 1377US9740106B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2015·Granted Aug 22, 2017·1 cites·66 claims
- 1463US7202938B2Off-axis levelling in lithographic projection apparatusASML NETHERLANDS BV·Filed 2004·Granted Apr 10, 2007·5 cites·15 claims
- 1562US6955074B2Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Oct 18, 2005·7 cites·27 claims
- 1660US10345711B2Substrate placement in immersion lithographyASML NETHERLANDS BV·Filed 2017·Granted Jul 9, 2019·0 cites·20 claims
- 1757US6987555B2Lithographic apparatus, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Jan 17, 2006·5 cites·29 claims
- 1852US7835017B2Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Nov 16, 2010·3 cites·28 claims
- 1945US11156928B2Alignment mark for two-dimensional alignment in an alignment systemASML HOLDING NV·Filed 2018·Granted Oct 26, 2021·0 cites·21 claims
- 2045US9506743B2Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Nov 29, 2016·0 cites·15 claims
- 2140US11054751B2Apparatus with a sensor and a method of performing target measurementASML HOLDING NV·Filed 2016·Granted Jul 6, 2021·0 cites·20 claims
- 2238US2005134816A1Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Application pending·0 cites
- 2335US7280228B2System and method of measurement, system and method of alignment, lithographic apparatus and methodASML NETHERLANDS BV·Filed 2004·Granted Oct 9, 2007·0 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →