Inventor · disambiguated record
Cesar M. Garza
Also filed as: GARZA CESAR · GARZA CESAR M · GARZA CÉSAR M
13 granted patents·6 pending applications·419 citations·filing 1987–2025
92Inventor score
Files withTEXAS INSTRUMENTS INC7FREESCALE SEMICONDUCTOR INC4SAMSUNG ELECTRONICS CO LTD2CONLEY WILLARD E1ENVERUS INC1
Top patents by PatentIndex Score
19 records- 0195US4891303ATrilayer microlithographic process using a silicon-based resist as the middle layerTEXAS INSTRUMENTS INC·Filed 1988·Granted Jan 2, 1990·211 cites·13 claims
- 0284US4770739ABilayer photoresist processTEXAS INSTRUMENTS INC·Filed 1987·Granted Sep 13, 1988·80 cites·33 claims
- 0378US4882008ADry development of photoresistTEXAS INSTRUMENTS INC·Filed 1988·Granted Nov 21, 1989·48 cites·29 claims
- 0476US5094936AHigh pressure photoresist silylation process and apparatusTEXAS INSTRUMENTS INC·Filed 1990·Granted Mar 10, 1992·30 cites·5 claims
- 0568US6649452B2Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor waferMOTOROLA INC·Filed 2002·Granted Nov 18, 2003·10 cites·14 claims
- 0666US6849515B1Semiconductor process for disposable sidewall spacersFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Feb 1, 2005·10 cites·17 claims
- 0764US7901852B2Metrology of bilayer photoresist processesFREESCALE SEMICONDUCTOR INC·Filed 2008·Granted Mar 8, 2011·2 cites·23 claims
- 0858US7157377B2Method of making a semiconductor device using treated photoresistFREESCALE SEMICONDUCTOR INC·Filed 2004·Granted Jan 2, 2007·6 cites·19 claims
- 0952US6797440B2Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor deviceFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Sep 28, 2004·3 cites·22 claims
- 1050US2025315749A1Multi-agent modeling for energyENVERUS INC·Filed 2025·Application pending·0 cites
- 1149US10786787B2Methods of fluorinating filters used in the manufacture of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Sep 29, 2020·0 cites·20 claims
- 1247US2005224455A1Method for making a semiconductor device using treated photoresist as an implant maskMONTGOMERY PATRICK K·Filed 2005·Application pending·0 cites
- 1344US6593033B1Attenuated rim phase shift maskTEXAS INSTRUMENTS INC·Filed 1999·Granted Jul 15, 2003·11 cites·8 claims
- 1440US2010099255A1Method of forming a contact through an insulating layerCONLEY WILLARD E·Filed 2008·Application pending·0 cites
- 1538US5716738ADark rims for attenuated phase shift maskTEXAS INSTRUMENTS INC·Filed 1996·Granted Feb 10, 1998·5 cites·19 claims
- 1638US2005026084A1Semiconductor device and method for elimination of resist linewidth slimming by fluorinationFiled 2003·Application pending·0 cites
- 1735US2017137589A1Methods of modifying surfaces of structures used in the manufacture of a semiconductor device via fluorinationSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 1831US2004137371A1Method of making a semiconductor device using a pellicle that is transparent at short wavelengthsFiled 2003·Application pending·0 cites
- 1928US5085729AUniformity using stagnant silylationTEXAS INSTRUMENTS INC·Filed 1990·Granted Feb 4, 1992·3 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →