Inventor · disambiguated record
Ryoki Tobe
Also filed as: TOBE RYOKI
6 granted patents·1 pending application·727 citations·filing 1996–2001
88Inventor score
Files withANELVA CORP6
Top patents by PatentIndex Score
7 records- 0197US5891349APlasma enhanced CVD apparatus and process, and dry etching apparatus and processANELVA CORP·Filed 1996·Granted Apr 6, 1999·308 cites·36 claims
- 0296US5855685APlasma enhanced CVD apparatus, plasma enhanced processing apparatus and plasma enhanced CVD methodANELVA CORP·Filed 1996·Granted Jan 5, 1999·220 cites·27 claims
- 0390US6080446AMethod of depositing titanium nitride thin film and CVD deposition apparatusANELVA CORP·Filed 1998·Granted Jun 27, 2000·106 cites·5 claims
- 0488US5721021AMethod of depositing titanium-containing conductive thin filmANELVA CORP·Filed 1996·Granted Feb 24, 1998·62 cites·14 claims
- 0573US6468604B1Method for manufacturing a titanium nitride thin filmANELVA CORP·Filed 2000·Granted Oct 22, 2002·10 cites·20 claims
- 0658US6471781B1Method of depositing titanium nitride thin film and CVD deposition apparatusANELVA CORP·Filed 1999·Granted Oct 29, 2002·21 cites·7 claims
- 0745US2002015791A1Method and manufacturing device for manufacturing a titanium nitride thin filmFiled 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Ryoki Tobe files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →