Inventor · disambiguated record
Stefan Michael Bruno Bäumer
Also filed as: BAUMER STEFAN · BAUMER STEFAN M · BAUMER STEFAN MICHAEL BRUNO · BÄUMER STEFAN MICHAEL BRUNO
8 granted patents·2 pending applications·4 citations·filing 2005–2020
74Inventor score
Files withASML NETHERLANDS BV5KONINKL PHILIPS ELECTRONICS NV1KONINKL PHILIPS NV1KRAUSS MAFFEI KUNSTSTOFFTECH1NEDERLANDSE ORGANISATIE VOOR TOEGEPAST NATUURWETENSCHAPPELIJK ONDERZOEK TNO1
Top patents by PatentIndex Score
10 records- 0181US10725381B2Optical systems, metrology apparatus and associated methodASML NETHERLANDS BV·Filed 2018·Granted Jul 28, 2020·3 cites·15 claims
- 0267US10401723B2Patterning deviceASML NETHERLANDS BV·Filed 2017·Granted Sep 3, 2019·1 cites·13 claims
- 0361US10732498B2Patterning deviceASML NETHERLANDS BV·Filed 2019·Granted Aug 4, 2020·0 cites·20 claims
- 0451US10983361B2Methods of aligning a diffractive optical system and diffracting beams, diffractive optical element and apparatusASML NETHERLANDS BV·Filed 2018·Granted Apr 20, 2021·0 cites·20 claims
- 0542US7372220B2Extrusion plant with synchronized drive units, and method of synchronization of drive unitsKRAUSS MAFFEI KUNSTSTOFFTECH·Filed 2005·Granted May 13, 2008·0 cites·10 claims
- 0641US2015276166A1Optical cover for a light emitting moduleKONINKL PHILIPS NV·Filed 2013·Application pending·0 cites
- 0738US10712674B2Method of determining an overlay error, manufacturing method and system for manufacturing of a multilayer semiconductor device, and semiconductor device manufactured therebyTNO·Filed 2016·Granted Jul 14, 2020·0 cites·16 claims
- 0836US12007693B2Laser focussing moduleASML NETHERLANDS BV·Filed 2020·Granted Jun 11, 2024·0 cites·18 claims
- 0934US11378448B2Optical device and spectrometer comprising such a deviceNederlandse Organisatie Voor Toegepast—Natuurwetenschappelijk Onderzoek Tno·Filed 2019·Granted Jul 5, 2022·0 cites·10 claims
- 1033US2007247639A1Device and Method for Optical Precision MeasurementKONINKL PHILIPS ELECTRONICS NV·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →