Inventor · disambiguated record
Joseph H. Lyons
Also filed as: LYONS JOSEPH · LYONS JOSEPH H · LYONS JOSEPH HARRY
21 granted patents·6 pending applications·114 citations·filing 2000–2023
94Inventor score
Top patents by PatentIndex Score
27 records- 0194US10558129B2Mask assemblyASML NETHERLANDS BV·Filed 2015·Granted Feb 11, 2020·7 cites·44 claims
- 0287US11656555B2Lithographic apparatus and illumination uniformity correction systemASML HOLDING NV·Filed 2020·Granted May 23, 2023·3 cites·20 claims
- 0385US7472580B2Pressure sensorASML HOLDING NV·Filed 2006·Granted Jan 6, 2009·16 cites·16 claims
- 0484US7940374B2Parallel process focus compensationASML HOLDING NV·Filed 2008·Granted May 10, 2011·7 cites·26 claims
- 0583US7549321B2Pressure sensorASML HOLDING NV·Filed 2006·Granted Jun 23, 2009·13 cites·17 claims
- 0678US6633050B1Virtual gauging system for use in lithographic processingASML HOLDING NV·Filed 2000·Granted Oct 14, 2003·16 cites·5 claims
- 0776US2024103386A1Apparatus and method for determining a condition associated with a pellicleASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0875US6885429B2System and method for automated focus measuring of a lithography toolASML HOLDING NV·Filed 2002·Granted Apr 26, 2005·13 cites·27 claims
- 0973US7134321B2Fluid gauge proximity sensor and method of operating same using a modulated fluid flowASML HOLDING NV·Filed 2004·Granted Nov 14, 2006·15 cites·14 claims
- 1072US8390782B2Multi nozzle proximity sensor employing common sensing and nozzle shapingLYONS JOSEPH H·Filed 2009·Granted Mar 5, 2013·4 cites·26 claims
- 1168US11009803B2Mask assemblyASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·0 cites·18 claims
- 1267US7081948B2System for automated focus measuring of a lithography toolASML HOLDING NV·Filed 2005·Granted Jul 25, 2006·2 cites·16 claims
- 1366US9358696B2Low and high pressure proximity sensorsLYONS JOSEPH H·Filed 2010·Granted Jun 7, 2016·2 cites·20 claims
- 1461US6984836B2System and method for monitoring the topography of a wafer surface during lithographic processingASML HOLDING NV·Filed 2003·Granted Jan 10, 2006·5 cites·15 claims
- 1560US11906907B2Apparatus and method for determining a condition associated with a pellicleASML NETHERLANDS BV·Filed 2018·Granted Feb 20, 2024·0 cites·20 claims
- 1658US6979833B2System for monitoring the topography of a wafer surface during lithographic processingASML HOLDING NV·Filed 2004·Granted Dec 27, 2005·4 cites·5 claims
- 1757US12158705B2End-of-life monitoring of dynamic gas lock membranes and pupil facet mirrors and detection of membrane rupture in lithographic apparatusesASML HOLDING NV·Filed 2021·Granted Dec 3, 2024·0 cites·20 claims
- 1857US7021121B2Gas gauge proximity sensor with a modulated gas flowASML HOLDING NV·Filed 2004·Granted Apr 4, 2006·7 cites·47 claims
- 1953US8144306B2Reverse flow gas gauge proximity sensorLYONS JOSEPH H·Filed 2009·Granted Mar 27, 2012·0 cites·20 claims
- 2052US7049618B2Virtual gauging method for use in lithographic processingASML HOLDING NV·Filed 2005·Granted May 23, 2006·0 cites·6 claims
- 2148US2010103399A1Fluid Assisted Gas Gauge Proximity SensorASML HOLDING NV·Filed 2009·Application pending·0 cites
- 2245USRE42650EFluid gauge proximity sensor and method of operating same using a modulated fluid flowASML HOLDING NV·Filed 2007·Granted Aug 30, 2011·0 cites·14 claims
- 2344US2008034888A1High-Resolution Gas Gauge Proximity SensorASML HOLDING NV·Filed 2007·Application pending·0 cites
- 2443US10429748B2Apparatus including a gas gauge and method of operating the sameASML HOLDING NV·Filed 2016·Granted Oct 1, 2019·0 cites·20 claims
- 2542US2007151328A1Vacuum driven proximity sensorASML HOLDING NV·Filed 2005·Application pending·0 cites
- 2640US2022146948A1Electrostatic clamp for a lithographic apparatusASML HOLDING NV·Filed 2020·Application pending·0 cites
- 2739US2005044963A1High-resolution gas gauge proximity sensorASML HOLDING NV·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →