Inventor · disambiguated record
Pei-Yi Liu
Also filed as: Liu pei-yi
29 granted patents·2 pending applications·236 citations·filing 2011–2024
96Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD15TAIWAN SEMICONDUCTOR MFG7BENQ MATERIALS CORP3Liu pei-yi2WANG WEN CHUAN2
Top patents by PatentIndex Score
31 records- 0198US8828632B2Multiple-grid exposure methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 9, 2014·26 cites·20 claims
- 0297US8822106B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 2, 2014·31 cites·22 claims
- 0397US8584057B2Non-directional dithering methodsLiu pei-yi·Filed 2012·Granted Nov 12, 2013·33 cites·20 claims
- 0497US8510687B1Error diffusion and grid shift in lithographyLiu pei-yi·Filed 2012·Granted Aug 13, 2013·32 cites·20 claims
- 0596US8530121B2Multiple-grid exposure methodWANG WEN CHUAN·Filed 2012·Granted Sep 10, 2013·37 cites·20 claims
- 0695US9594862B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 14, 2017·19 cites·16 claims
- 0791US9958578B2Composition for manufacturing contact lenses and method for manufacturing contact lenses by using the sameBENQ MATERIALS CORP·Filed 2017·Granted May 1, 2018·2 cites·6 claims
- 0891US9703009B2Material for contact lenses, contact lenses and method of forming the sameBENQ MAT CORP·Filed 2015·Granted Jul 11, 2017·3 cites·13 claims
- 0990US9436788B2Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 6, 2016·11 cites·19 claims
- 1090US9436787B2Method of fabricating an integrated circuit with optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 6, 2016·11 cites·20 claims
- 1189US11061317B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 13, 2021·4 cites·20 claims
- 1288US9329488B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted May 3, 2016·2 cites·20 claims
- 1387US10170276B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 1, 2019·3 cites·20 claims
- 1487US8972908B2Method for electron beam proximity correction with improved critical dimension accuracyTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 3, 2015·10 cites·20 claims
- 1585US8822107B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 2, 2014·5 cites·25 claims
- 1680US10811225B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 20, 2020·1 cites·20 claims
- 1779US10431423B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 1, 2019·1 cites·20 claims
- 1877US9176389B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Nov 3, 2015·2 cites·20 claims
- 1974US2025107207A1Semiconductor Device Structure with Uneven Gate ProfileTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2071US12166096B2Semiconductor device structure with uneven gate profileTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 10, 2024·0 cites·20 claims
- 2171US10795057B2Composition for manufacturing contact lensesBENQ MATERIALS CORP·Filed 2017·Granted Oct 6, 2020·0 cites·6 claims
- 2270US10359695B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 23, 2019·1 cites·20 claims
- 2365US10356802B2Base station and scheduling method of uplink resource unitIND TECH RES INST·Filed 2017·Granted Jul 16, 2019·2 cites·16 claims
- 2463US9529271B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 27, 2016·0 cites·20 claims
- 2561US9678434B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 13, 2017·0 cites·20 claims
- 2660US9552964B2Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 24, 2017·0 cites·21 claims
- 2755US11631745B2Semiconductor device structure with uneven gate profileTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 18, 2023·0 cites·20 claims
- 2854US9658538B2System and technique for rasterizing circuit layout dataTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 23, 2017·0 cites·20 claims
- 2950US8984452B2Long-range lithographic dose correctionTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 17, 2015·0 cites·20 claims
- 3042US9134627B2Multiple-patterning overlay decoupling methodWANG WEN-CHUAN·Filed 2011·Granted Sep 15, 2015·0 cites·20 claims
- 3128US2015338681A1Method for manufacturing a colored contact lensBENQ MATERIALS CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →