Inventor · disambiguated record
Christopher J. Leavitt
Also filed as: LEAVITT CHRISTOPHER · LEAVITT CHRISTOPHER J
16 granted patents·6 pending applications·64 citations·filing 2006–2022
91Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT ASS INC6VARIAN SEMICONDUCTOR EQUIPMENT5APPLIED MATERIALS INC3GODET LUDOVIC2KOO BON-WOONG1
Top patents by PatentIndex Score
22 records- 0195US8698107B2Technique and apparatus for monitoring ion mass, energy, and angle in processing systemsGODET LUDOVIC·Filed 2011·Granted Apr 15, 2014·26 cites·14 claims
- 0290US9840772B2Method of improving ion beam quality in a non-mass-analyzed ion implantation systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Dec 12, 2017·2 cites·20 claims
- 0388US8354655B2Method and system for controlling critical dimension and roughness in resist featuresVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2011·Granted Jan 15, 2013·7 cites·15 claims
- 0486US9865430B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jan 9, 2018·3 cites·12 claims
- 0586US9677171B2Method of improving ion beam quality in a non-mass-analyzed ion implantation systemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Jun 13, 2017·2 cites·16 claims
- 0682US8623171B2Plasma processing apparatusGODET LUDOVIC·Filed 2009·Granted Jan 7, 2014·6 cites·9 claims
- 0782US8461554B1Apparatus and method for charge neutralization during processing of a workpieceKURUNCZI PETER F·Filed 2011·Granted Jun 11, 2013·6 cites·19 claims
- 0879US9711316B2Method of cleaning an extraction electrode assembly using pulsed biasingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2013·Granted Jul 18, 2017·4 cites·7 claims
- 0978US10290466B2Boron implanting using a co-gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted May 14, 2019·1 cites·19 claims
- 1077US8669538B1Method of improving ion beam quality in an implant systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Mar 11, 2014·3 cites·20 claims
- 1174US9034743B2Method for implant productivity enhancementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted May 19, 2015·3 cites·14 claims
- 1262US11615945B2Plasma processing apparatus and techniquesAPPLIED MATERIALS INC·Filed 2021·Granted Mar 28, 2023·0 cites·10 claims
- 1360US12165852B2Cover ring to mitigate carbon contamination in plasma doping chamberAPPLIED MATERIALS INC·Filed 2022·Granted Dec 10, 2024·0 cites·15 claims
- 1458US2018087148A1Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Implantation SystemVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Application pending·0 cites
- 1557US8907307B2Apparatus and method for maskless patterned implantationLEAVITT CHRISTOPHER J·Filed 2011·Granted Dec 9, 2014·1 cites·19 claims
- 1656US11120973B2Plasma processing apparatus and techniquesAPPLIED MATERIALS INC·Filed 2019·Granted Sep 14, 2021·0 cites·6 claims
- 1753US8698109B2Method and system for controlling critical dimension and roughness in resist featuresVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Apr 15, 2014·0 cites·6 claims
- 1847US2010155600A1Method and apparatus for plasma dose measurementVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Application pending·0 cites
- 1943US2022174902A1In-Vitro Photoautotrophic Propagation of CannabisNODE LABS INC·Filed 2022·Application pending·0 cites
- 2042US2014021373A1Beamline electrode voltage modulation for ion beam glitch recoveryLUBICKI PIOTR·Filed 2012·Application pending·0 cites
- 2141US2008160212A1Method and apparatuses for providing electrical contact for plasma processing applicationsKOO BON-WOONG·Filed 2006·Application pending·0 cites
- 2237US2012000421A1Control apparatus for plasma immersion ion implantation of a dielectric substrateMILLER TIMOTHY·Filed 2010·Application pending·0 cites
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