Inventor · disambiguated record
Ing-Yann Albert Wang
Also filed as: WANG ING-YANN · WANG ING-YANN ALBERT
8 granted patents·2 pending applications·1,311 citations·filing 2005–2013
89Inventor score
Top patents by PatentIndex Score
10 records- 0198US8425682B2High strip rate downstream chamberLAM RES CORP·Filed 2012·Granted Apr 23, 2013·378 cites·16 claims
- 0298US7476291B2High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivationLAM RES CORP·Filed 2006·Granted Jan 13, 2009·529 cites·21 claims
- 0396US8298336B2High strip rate downstream chamberWANG ING-YANN·Filed 2005·Granted Oct 30, 2012·384 cites·28 claims
- 0485US7824519B2Variable volume plasma processing chamber and associated methodsLAM RES CORP·Filed 2007·Granted Nov 2, 2010·9 cites·11 claims
- 0578US7554053B2Corrugated plasma trap arrangement for creating a highly efficient downstream microwave plasma systemLAM RES CORP·Filed 2005·Granted Jun 30, 2009·3 cites·52 claims
- 0673US8048329B2Methods for implementing highly efficient plasma trapsLAM RES CORP·Filed 2009·Granted Nov 1, 2011·6 cites·20 claims
- 0761US7562638B2Methods and arrangement for implementing highly efficient plasma trapsLAM RES CORP·Filed 2005·Granted Jul 21, 2009·2 cites·30 claims
- 0847US7679024B2Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamberLAM RES CORP·Filed 2005·Granted Mar 16, 2010·0 cites·24 claims
- 0946US2011023779A1Variable Volume Plasma Processing Chamber and Associated MethodsLAM RES CORP·Filed 2010·Application pending·0 cites
- 1041US2014261803A1High strip rate downstream chamberLAM RES CORP·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →