Inventor · disambiguated record
Mitsuo Hagihara
Also filed as: HAGIHARA MITSUO
8 granted patents·2 pending applications·30 citations·filing 1998–2016
81Inventor score
Files withTOKYO OHKA KOGYO CO LTD10
Top patents by PatentIndex Score
10 records- 0178US10141547B2Nonaqueous secondary battery and method for manufacturing sameTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Nov 27, 2018·2 cites·13 claims
- 0259US7666569B2Positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Feb 23, 2010·6 cites·2 claims
- 0357US7402372B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Jul 22, 2008·5 cites·12 claims
- 0455US6120969APolyphenol compound, quinonediazide ester and positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Sep 19, 2000·14 cites·5 claims
- 0553US6730769B2Novolak resin, production process thereof and positive photoresist composition using the novolak resinTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted May 4, 2004·3 cites·9 claims
- 0645US9964851B2Resist pattern forming method and developer for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted May 8, 2018·0 cites·2 claims
- 0741US2008107971A1Silylphenylene Polymer Composition For The Formation Of Interlayers And Process For The Formation Of Patterns By Using The SameTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 0835US6630279B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Oct 7, 2003·0 cites·3 claims
- 0935US2005042540A1Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 1033US6680155B2Positive photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jan 20, 2004·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →