Inventor · disambiguated record
Paul Alan Stockman
Also filed as: STOCKMAN PAUL A · STOCKMAN PAUL ALAN
7 granted patents·8 pending applications·51 citations·filing 2004–2018
85Inventor score
Files withASML NETHERLANDS BV4CIGAL JEAN-CHARLES3HARPHAM ANDREW JOHN2BOC GROUP PLC1COLOMB BERTRAND MICHEL JEAN-CLAUDE1
Top patents by PatentIndex Score
15 records- 0188US8830440B2Vacuum system for immersion photolithographyHARPHAM ANDREW JOHN·Filed 2011·Granted Sep 9, 2014·5 cites·22 claims
- 0287US9857699B2Vacuum system for immersion photolithographyASML NETHERLANDS BV·Filed 2016·Granted Jan 2, 2018·2 cites·20 claims
- 0383US8164734B2Vacuum system for immersion photolithographyHARPHAM ANDREW JOHN·Filed 2008·Granted Apr 24, 2012·9 cites·20 claims
- 0478US7481867B2Vacuum system for immersion photolithographyEDWARDS LTD·Filed 2004·Granted Jan 27, 2009·17 cites·25 claims
- 0577US9507270B2Vacuum system for immersion photolithographyASML NETHERLANDS BV·Filed 2014·Granted Nov 29, 2016·1 cites·21 claims
- 0667US7368000B2Treatment of effluent gasesBOC GROUP PLC·Filed 2004·Granted May 6, 2008·17 cites·18 claims
- 0765US10168624B2Vacuum system for immersion photolithographyASML NETHERLANDS BV·Filed 2017·Granted Jan 1, 2019·0 cites·20 claims
- 0865US2019094715A1Vacuum system for immersion photolithographyASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 0956US2011041872A1Rapid supply of fluorine source gas to remote plasma for chamber cleaningHOGLE RICHARD ALLEN·Filed 2009·Application pending·0 cites
- 1047US2013133697A1Prevention of post-pecvd vacuum and abatement system fouling using a fluorine containing cleaning gas chamberSTOCKMAN PAUL A·Filed 2012·Application pending·0 cites
- 1140US2013239988A1Deposition chamber cleaning using in situ activation of molecular fluorineCIGAL JEAN-CHARLES·Filed 2011·Application pending·0 cites
- 1237US2006001851A1Immersion photolithography systemGRANT ROBERT B·Filed 2004·Application pending·0 cites
- 1337US2013220364A1Reactor box chamber cleaning using molecular fluorineCIGAL JEAN-CHARLES·Filed 2011·Application pending·0 cites
- 1431US2012092950A1Low pressure drop blenderCOLOMB BERTRAND MICHEL JEAN-CLAUDE·Filed 2010·Application pending·0 cites
- 1531US2013276820A1Chemical vapor deposition chamber cleaning with molecular fluorineCIGAL JEAN-CHARLES·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →