Inventor · disambiguated record
Gerald Yin
Also filed as: YIN GERALD · YIN GERALD Z · YIN GERALD ZHEYAO
89 granted patents·10 pending applications·9,865 citations·filing 1988–2022
99Inventor score
Files withAPPLIED MATERIALS INC74ADVANCED MICRO FAB EQUIP INC7ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA3ADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI3CHEN AIHUA2
Top patents by PatentIndex Score
99 records- 0199US6528751B1Plasma reactor with overhead RF electrode tuned to the plasmaAPPLIED MATERIALS INC·Filed 2000·Granted Mar 4, 2003·266 cites·94 claims
- 0299US6120640ABoron carbide parts and coatings in a plasma reactorAPPLIED MATERIALS INC·Filed 1996·Granted Sep 19, 2000·348 cites·43 claims
- 0399US5730801ACompartnetalized substrate processing chamberAPPLIED MATERIALS INC·Filed 1994·Granted Mar 24, 1998·836 cites·47 claims
- 0498US6699399B1Self-cleaning etch processAPPLIED MATERIALS INC·Filed 2000·Granted Mar 2, 2004·500 cites·72 claims
- 0598US6379575B1Treatment of etching chambers using activated cleaning gasAPPLIED MATERIALS INC·Filed 1997·Granted Apr 30, 2002·375 cites·47 claims
- 0698US6340435B1Integrated low K dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 1999·Granted Jan 22, 2002·536 cites·14 claims
- 0798US5885358AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1996·Granted Mar 23, 1999·203 cites·30 claims
- 0898US5643394AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1994·Granted Jul 1, 1997·215 cites·73 claims
- 0997US6858153B2Integrated low K dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 2001·Granted Feb 22, 2005·256 cites·21 claims
- 1097US6518195B1Plasma reactor using inductive RF coupling, and processesAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·162 cites·8 claims
- 1197US6308654B1Inductively coupled parallel-plate plasma reactor with a conical domeAPPLIED MATERIALS INC·Filed 1996·Granted Oct 30, 2001·206 cites·31 claims
- 1297US5904778ASilicon carbide composite article particularly useful for plasma reactorsAPPLIED MATERIALS INC·Filed 1996·Granted May 18, 1999·146 cites·41 claims
- 1397US5746875AGas injection slit nozzle for a plasma process reactorAPPLIED MATERIALS INC·Filed 1995·Granted May 5, 1998·169 cites·18 claims
- 1497US5556501ASilicon scavenger in an inductively coupled RF plasma reactorAPPLIED MATERIALS INC·Filed 1993·Granted Sep 17, 1996·396 cites·15 claims
- 1597US5198725AMethod of producing flat ecr layer in microwave plasma device and apparatus thereforLAM RES CORP·Filed 1991·Granted Mar 30, 1993·129 cites·21 claims
- 1697US4871421ASplit-phase driver for plasma etch systemLAM RES CORP·Filed 1988·Granted Oct 3, 1989·168 cites·9 claims
- 1796US7030335B2Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppressionAPPLIED MATERIALS INC·Filed 2001·Granted Apr 18, 2006·72 cites·125 claims
- 1896US6488807B1Magnetic confinement in a plasma reactor having an RF bias electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Dec 3, 2002·145 cites·6 claims
- 1996US6352049B1Plasma assisted processing chamber with separate control of species densityAPPLIED MATERIALS INC·Filed 1998·Granted Mar 5, 2002·498 cites·24 claims
- 2096US6189484B1Plasma reactor having a helicon wave high density plasma sourceAPPLIED MATERIALS INC·Filed 1999·Granted Feb 20, 2001·116 cites·44 claims
- 2196US6074512AInductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·236 cites·101 claims
- 2296US5756400AMethod and apparatus for cleaning by-products from plasma chamber surfacesAPPLIED MATERIALS INC·Filed 1995·Granted May 26, 1998·407 cites·13 claims
- 2395US7503996B2Multiple frequency plasma chamber, switchable RF system, and processes using sameADVANCED MICRO FAB EQUIP INC·Filed 2007·Granted Mar 17, 2009·33 cites·21 claims
- 2495US6602434B1Process for etching oxide using hexafluorobutadiene or related fluorocarbons and manifesting a wide process windowAPPLIED MATERIALS INC·Filed 1999·Granted Aug 5, 2003·280 cites·54 claims
- 2594US7658800B2Gas distribution assembly for use in a semiconductor work piece processing reactorADVANCED MICRO FAB EQUIP INC·Filed 2006·Granted Feb 9, 2010·28 cites·21 claims
- 2694US6136211ASelf-cleaning etch processAPPLIED MATERIALS INC·Filed 1997·Granted Oct 24, 2000·160 cites·43 claims
- 2794US5710486AInductively and multi-capacitively coupled plasma reactorAPPLIED MATERIALS INC·Filed 1995·Granted Jan 20, 1998·139 cites·31 claims
- 2894US5451784AComposite diagnostic wafer for semiconductor wafer processing systemsAPPLIED MATERIALS INC·Filed 1994·Granted Sep 19, 1995·83 cites·31 claims
- 2993US6949203B2System level in-situ integrated dielectric etch process particularly useful for copper dual damasceneAPPLIED MATERIALS INC·Filed 2003·Granted Sep 27, 2005·69 cites·46 claims
- 3093US6669858B2Integrated low k dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 2001·Granted Dec 30, 2003·47 cites·14 claims
- 3193US6270687B1RF plasma methodAPPLIED MATERIALS INC·Filed 2000·Granted Aug 7, 2001·42 cites·28 claims
- 3293US5753044ARF plasma reactor with hybrid conductor and multi-radius dome ceilingAPPLIED MATERIALS INC·Filed 1995·Granted May 19, 1998·91 cites·121 claims
- 3393US5540824APlasma reactor with multi-section RF coil and isolated conducting lidAPPLIED MATERIALS INC·Filed 1994·Granted Jul 30, 1996·85 cites·31 claims
- 3492US6838635B2Plasma reactor with overhead RF electrode tuned to the plasmaHOFFMAN DANIEL J·Filed 2002·Granted Jan 4, 2005·36 cites·16 claims
- 3592US6471822B1Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasmaAPPLIED MATERIALS INC·Filed 1999·Granted Oct 29, 2002·88 cites·50 claims
- 3692US6251792B1Plasma etch processesAPPLIED MATERIALS INC·Filed 1997·Granted Jun 26, 2001·122 cites·18 claims
- 3792US6071372ARF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber wallsAPPLIED MATERIALS INC·Filed 1997·Granted Jun 6, 2000·69 cites·49 claims
- 3892US5607542AInductively enhanced reactive ion etchingAPPLIED MATERIALS INC·Filed 1994·Granted Mar 4, 1997·78 cites·20 claims
- 3991US6074959AMethod manifesting a wide process window and using hexafluoropropane or other hydrofluoropropanes to selectively etch oxideAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·123 cites·54 claims
- 4090US8336488B2Multi-station plasma reactor with multiple plasma regionsCHEN AIHUA·Filed 2007·Granted Dec 25, 2012·11 cites·28 claims
- 4190US6402885B2Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasmaAPPLIED MATERIALS INC·Filed 2001·Granted Jun 11, 2002·42 cites·14 claims
- 4290US6024826APlasma reactor with heated source of a polymer-hardening precursor materialAPPLIED MATERIALS INC·Filed 1996·Granted Feb 15, 2000·100 cites·68 claims
- 4389US7227244B2Integrated low k dielectrics and etch stopsAPPLIED MATERIALS INC·Filed 2004·Granted Jun 5, 2007·27 cites·8 claims
- 4489US6454898B1Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 2000·Granted Sep 24, 2002·43 cites·28 claims
- 4589US6174451B1Oxide etch process using hexafluorobutadiene and related unsaturated hydrofluorocarbonsAPPLIED MATERIALS INC·Filed 1998·Granted Jan 16, 2001·94 cites·52 claims
- 4689US5900062ALift pin for dechucking substratesAPPLIED MATERIALS INC·Filed 1995·Granted May 4, 1999·102 cites·39 claims
- 4789US5897712APlasma uniformity control for an inductive plasma sourceAPPLIED MATERIALS INC·Filed 1996·Granted Apr 27, 1999·63 cites·27 claims
- 4888US6500357B1System level in-situ integrated dielectric etch process particularly useful for copper dual damasceneAPPLIED MATERIALS INC·Filed 2000·Granted Dec 31, 2002·38 cites·14 claims
- 4987US6387287B1Process for etching oxide using a hexafluorobutadiene and manifesting a wide process windowAPPLIED MATERIALS INC·Filed 1999·Granted May 14, 2002·94 cites·18 claims
- 5087US6270617B1RF plasma reactor with hybrid conductor and multi-radius dome ceilingAPPLIED MATERIALS INC·Filed 1997·Granted Aug 7, 2001·48 cites·49 claims
Showing the top 50 of 99 patent records by PatentIndex Score.
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