Inventor · disambiguated record
Dennis K. Coultas
Also filed as: COULTAS DENNIS K · COULTAS DENNIS KEITH
13 granted patents·950 citations·filing 1975–1998
94Inventor score
Files withIBM13
Top patents by PatentIndex Score
13 records- 0198US5304279ARadio frequency induction/multipole plasma processing toolIBM·Filed 1992·Granted Apr 19, 1994·252 cites·25 claims
- 0298US5206516ALow energy, steered ion beam deposition system having high current at low pressureIBM·Filed 1991·Granted Apr 27, 1993·172 cites·40 claims
- 0395US5241245AOptimized helical resonator for plasma processingIBM·Filed 1992·Granted Aug 31, 1993·158 cites·8 claims
- 0494US5767628AHelicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channelIBM·Filed 1995·Granted Jun 16, 1998·98 cites·36 claims
- 0592US6051151AApparatus and method of producing a negative ion plasmaIBM·Filed 1997·Granted Apr 18, 2000·77 cites·25 claims
- 0678US5866985AStable matching networks for plasma toolsIBM·Filed 1996·Granted Feb 2, 1999·69 cites·38 claims
- 0775US5207437ACeramic electrostatic wafer chuckIBM·Filed 1991·Granted May 4, 1993·57 cites·7 claims
- 0868US5332441AApparatus for gettering of particles during plasma processingIBM·Filed 1991·Granted Jul 26, 1994·17 cites·10 claims
- 0966US5433258AGettering of particles during plasma processingIBM·Filed 1994·Granted Jul 18, 1995·15 cites·9 claims
- 1056US5518547AMethod and apparatus for reducing particulates in a plasma tool through steady state flowsIBM·Filed 1993·Granted May 21, 1996·15 cites·14 claims
- 1155US5543184AMethod of reducing particulates in a plasma tool through steady state flowsIBM·Filed 1995·Granted Aug 6, 1996·10 cites·9 claims
- 1245US6028394ACold electron plasma reactive ion etching using a rotating electromagnetic filterIBM·Filed 1998·Granted Feb 22, 2000·6 cites·19 claims
- 1339US3997846AMethod and apparatus for electrostatic deflection of high current ion beams in scanning apparatusIBM·Filed 1975·Granted Dec 14, 1976·4 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →