Inventor · disambiguated record
Charlotte Cutler
Also filed as: CUTLER CHARLOTTE · CUTLER CHARLOTTE A
13 granted patents·14 pending applications·40 citations·filing 2006–2024
86Inventor score
Top patents by PatentIndex Score
27 records- 0196US9442377B1Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2015·Granted Sep 13, 2016·19 cites·14 claims
- 0295US10031420B2Wet-strippable silicon-containing antireflectantROHM & HAAS ELECT MAT·Filed 2016·Granted Jul 24, 2018·13 cites·14 claims
- 0392US11747733B2Freeze-less methods for self-aligned double patterningTOKYO ELECTRON LTD·Filed 2021·Granted Sep 5, 2023·2 cites·20 claims
- 0488US10114288B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Oct 30, 2018·3 cites·16 claims
- 0578US10007184B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2016·Granted Jun 26, 2018·1 cites·10 claims
- 0669US11733609B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2021·Granted Aug 22, 2023·0 cites·13 claims
- 0763US2019146343A1Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
- 0862US2018253006A1Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
- 0960US2025029837A1Methods and compositions for trench formation using advanced track-based patterning processesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1060US2023104679A1Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
- 1159US12411412B2Patterning semiconductor featuresTOKYO ELECTRON LTD·Filed 2022·Granted Sep 9, 2025·0 cites·21 claims
- 1259US2025021006A1Wafer Bow MitigationTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1358US12455507B2Method for removing material overburden via enhanced freeze-less anti-spacer formation using a bilayer systemTOKYO ELECTRON LTD·Filed 2022·Granted Oct 28, 2025·0 cites·18 claims
- 1458US12282254B2Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Granted Apr 22, 2025·0 cites·17 claims
- 1558US2023350303A1Dry Developing Metal-Free PhotoresistsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1658US2025172877A1Reversible overcoat compositionsTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1757US12394618B2Method of adjusting wafer shape using multi-directional actuation filmsTOKYO ELECTRON LTD·Filed 2022·Granted Aug 19, 2025·0 cites·20 claims
- 1857US8778601B2Methods of forming photolithographic patternsKANG SEOKHO·Filed 2011·Granted Jul 15, 2014·2 cites·20 claims
- 1957US2024363333A1Semiconductor Processing Using a Two-Dimensional PolymerTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2054US2024363340A1Inorganic/hybrid stress filmsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2153US2023251570A1Selective Deprotection via Dye DiffusionTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2249US2022336226A1Method of correcting wafer bow using a direct write stress filmTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2348US11360387B2Silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2018·Granted Jun 14, 2022·0 cites·15 claims
- 2443US11506979B2Method using silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2017·Granted Nov 22, 2022·0 cites·14 claims
- 2541US2007009821A1Devices containing multi-bit dataCUTLER CHARLOTTE·Filed 2006·Application pending·0 cites
- 2641US2007009201A1Electric field programmable films and memory devices based thereonROHM & HAAS ELECT MAT·Filed 2006·Application pending·0 cites
- 2738US2018164685A1Method using silicon-containing underlayersROHM & HAAS ELECT MAT·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →