Inventor · disambiguated record
Chunwei Chen
Also filed as: CHEN CHUNWEI
12 granted patents·8 pending applications·43 citations·filing 2005–2022
86Inventor score
Files withMERCK PATENT GMBH7AZ ELECTRONIC MATERIALS USA3CHEN CHUNWEI2LU PING-HUNG2AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1
Top patents by PatentIndex Score
20 records- 0190US7601482B2Negative photoresist compositionsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 13, 2009·16 cites·23 claims
- 0283US9012126B2Positive photosensitive materialLIU WEIHONG·Filed 2012·Granted Apr 21, 2015·5 cites·18 claims
- 0383US8906594B2Negative-working thick film photoresistCHEN CHUNWEI·Filed 2012·Granted Dec 9, 2014·7 cites·12 claims
- 0482US10013306B2Data recovery agent and search service for repairing bit rotOSNEXUS CORP·Filed 2016·Granted Jul 3, 2018·11 cites·25 claims
- 0568US7247419B2Nanocomposite photosensitive composition and use thereofAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Jul 24, 2007·2 cites·10 claims
- 0660US2025244669A1Compositions and methods of improving metal structure fabrication by wet chemical etchMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 0759US2023112024A1Dnq-free chemically amplified resist compositionMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 0859US2025028245A1Positive tone ultra thick photoresist compositionMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 0953US11822242B2DNQ-type photoresist composition including alkali-soluble acrylic resinsMERCK PATENT GMBH·Filed 2020·Granted Nov 21, 2023·0 cites·19 claims
- 1051US2024045333A1Positive-working photoresist composition with improved pattern profile and depth of focus (dof)MERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 1149US12388004B2Lithographically defined electrical interconnects from conductive pastesORMET CIRCUITS INC·Filed 2020·Granted Aug 12, 2025·0 cites·11 claims
- 1249US2017176856A1Negative-working photoresist compositions for laser ablation and use thereofAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Application pending·0 cites
- 1348US10976662B2Positive working photosensitive materialAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Apr 13, 2021·0 cites·38 claims
- 1448US10705424B2Negative-working photoresist compositions for laser ablation and use thereofAZ ELECTRONIC MAT LUXEMBOURG S AR L·Filed 2017·Granted Jul 7, 2020·0 cites·7 claims
- 1545US7524606B2Nanocomposite photoresist composition for imaging thick filmsAZ ELECTRONIC MATERIALS USA·Filed 2005·Granted Apr 28, 2009·2 cites·19 claims
- 1644US12393115B2Positive working photosensitive materialMERCK PATENT GMBH·Filed 2019·Granted Aug 19, 2025·0 cites·19 claims
- 1741US11698586B2Negative-working ultra thick film photoresistMERCK PATENT GMBH·Filed 2019·Granted Jul 11, 2023·0 cites·22 claims
- 1838US2013105440A1Nanocomposite negative photosensitive composition and use thereofLU PING-HUNG·Filed 2011·Application pending·0 cites
- 1938US2013108956A1Nanocomposite positive photosensitive composition and use thereofLU PING-HUNG·Filed 2011·Application pending·0 cites
- 2029US2007141510A1Nanocomposite photosensitive composition and use thereofCHEN CHUNWEI·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →