Inventor · disambiguated record
Hungbae Ahn
Also filed as: AHN HUNGBAE
4 granted patents·6 pending applications·5 citations·filing 2020–2025
60Inventor score
Files withSAMSUNG ELECTRONICS CO LTD10
Top patents by PatentIndex Score
10 records- 0191US11226552B2Method of manufacturing photomask set for forming patterns, and method of manufacturing semiconductor device using the photomask setSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Jan 18, 2022·5 cites·10 claims
- 0263US11740553B2Method of manufacturing photomask set for forming patternsSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Aug 29, 2023·0 cites·10 claims
- 0363US2025264794A1Optical proximity correction method, mask manufacturing method and semiconductor chip manufacturing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0460US2025362579A1Mask layout design method and mask manufacturing method including the mask layout design methodSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0560US2025208498A1Full-shot layout correction method and mask manufacturing method including the full-shot layout correction methodSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0658US2025155794A1Optical proximity correction method and method of manufacturing mask by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0753US2025348055A1Method of predicting failure patternSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 0852US2024143886A1Method of correcting layout for semiconductor process using machine learning, method of manufacturing semiconductor device using the same, and layout correction system performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0950US12260164B2Method for designing pattern layout including oblique edges and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 25, 2025·0 cites·20 claims
- 1049US11506983B2Method of designing mask layout based on error pattern and method of manufacturing maskSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Nov 22, 2022·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →