Inventor · disambiguated record
Frank Sobel
Also filed as: SOBEL FRANK
5 granted patents·7 pending applications·51 citations·filing 2003–2018
73Inventor score
Files withBECKER HANS2HEPTAGON MICRO OPTICS PTE LTD2AMS SENSORS SINGAPORE PTE LTD1ASCHKE LUTZ1HESS GUNTER1
Top patents by PatentIndex Score
12 records- 0188US7029803B2Attenuating phase shift mask blank and photomaskIBM·Filed 2003·Granted Apr 18, 2006·45 cites·50 claims
- 0262US10007052B2Method for manufacturing waveguide structures on wafer-level and corresponding waveguide structuresHEPTAGON MICRO OPTICS PTE LTD·Filed 2016·Granted Jun 26, 2018·0 cites·22 claims
- 0356US10215909B2Method for manufacturing waveguide structures on wafer-level and corresponding waveguide structuresHEPTAGON MICRO OPTICS PTE LTD·Filed 2018·Granted Feb 26, 2019·0 cites·20 claims
- 0456US7517617B2Mask blank for use in EUV lithography and method for its productionSCHOTT AG·Filed 2004·Granted Apr 14, 2009·6 cites·33 claims
- 0539US2006008749A1Method for manufacturing of a mask blank for EUV photolithography and mask blankSOBEL FRANK·Filed 2004·Application pending·0 cites
- 0637US10352764B2Concealed optoelectronic moduleAMS SENSORS SINGAPORE PTE LTD·Filed 2016·Granted Jul 16, 2019·0 cites·22 claims
- 0737US2007128528A1Mask blank and photomask having antireflective propertiesHESS GUNTER·Filed 2006·Application pending·0 cites
- 0835US2004231971A1Photo mask blank, photo mask, method and apparatus for manufacturing of a photo mask blankFiled 2004·Application pending·0 cites
- 0934US2005260504A1Mask blank having a protection layerBECKER HANS·Filed 2005·Application pending·0 cites
- 1034US2007076833A1Attenuated phase shift mask blank and photomaskBECKER HANS·Filed 2004·Application pending·0 cites
- 1134US2005190450A1Ultra high transmission phase shift mask blanksFiled 2005·Application pending·0 cites
- 1233US2006115744A1Method of producing a mask blank for photolithographic applications, and mask blankASCHKE LUTZ·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →