Inventor · disambiguated record
Kunbae Noh
Also filed as: NOH KUNBAE
9 granted patents·1 pending application·47 citations·filing 2009–2020
79Inventor score
Top patents by PatentIndex Score
10 records- 0196US9108880B2Nanostructured superhydrophobic, superoleophobic and/or superomniphobic coatings, methods for fabrication, and applications thereofJIN SUNGHO·Filed 2009·Granted Aug 18, 2015·46 cites·16 claims
- 0271US10106687B2Composition for forming silica layer, method for manufacturing silica layer and silica layerSAMSUNG SDI CO LTD·Filed 2016·Granted Oct 23, 2018·1 cites·12 claims
- 0343US12264075B2Composition for forming silica layer and silica layerSAMSUNG SDI CO LTD·Filed 2020·Granted Apr 1, 2025·0 cites·16 claims
- 0443US11201052B2Composition for forming silica layer, silica layer and electronic device incorporating silica layerSAMSUNG SDI CO LTD·Filed 2020·Granted Dec 14, 2021·0 cites·13 claims
- 0542US10804095B2Composition for forming silica layer, silica layer, and electronic deviceSAMSUNG SDI CO LTD·Filed 2018·Granted Oct 13, 2020·0 cites·16 claims
- 0642US9721785B2Method for manufacturing silica layer, silica layer, and electronic deviceSAMSUNG SDI CO LTD·Filed 2016·Granted Aug 1, 2017·0 cites·11 claims
- 0741US10017646B2Composition for forming silica layer, method for manufacturing silica layer, and electric device including silica layerSAMSUNG SDI CO LTD·Filed 2017·Granted Jul 10, 2018·0 cites·8 claims
- 0840US10153171B2Method of forming patterns, patterns formed according to the method, and semiconductor device including the patternsSAMSUNG SDI CO LTD·Filed 2017·Granted Dec 11, 2018·0 cites·11 claims
- 0934US11518909B2Composition for forming silica layer, manufacturing method for silica layer, and silica layerSAMSUNG SDI CO LTD·Filed 2018·Granted Dec 6, 2022·0 cites·12 claims
- 1031US2017250206A1Composition for forming silica layer, method for manufacturing silica layer, and silica layerSAMSUNG SDI CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →