Inventor · disambiguated record
Michiaki Matsushita
Also filed as: MATSUSHITA MICHIAKI
15 granted patents·3 pending applications·975 citations·filing 1993–2024
95Inventor score
Technology areasH10P
Top patents by PatentIndex Score
18 records- 0196US8528889B2Device and method for supporting a substrateNAKANO SEIJI·Filed 2010·Granted Sep 10, 2013·142 cites·9 claims
- 0296US5518542ADouble-sided substrate cleaning apparatusTOKYO ELECTRON LTD·Filed 1994·Granted May 21, 1996·265 cites·23 claims
- 0393US5964954ADouble-sided substrate cleaning apparatus and cleaning method using the sameTOKYO ELECTRON LTD·Filed 1997·Granted Oct 12, 1999·119 cites·4 claims
- 0490US6874515B2Substrate dual-side processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Apr 5, 2005·78 cites·5 claims
- 0590US5375291ADevice having brush for scrubbing substrateTOKYO ELECTRON LTD·Filed 1993·Granted Dec 27, 1994·127 cites·15 claims
- 0682US5421056ASpin chuck and treatment apparatus using sameTOKYO ELECTRON LTD·Filed 1994·Granted Jun 6, 1995·79 cites·20 claims
- 0779US12077392B2Substrate transfer apparatus and substrate transfer methodTOKYO ELECTRON LTD·Filed 2021·Granted Sep 3, 2024·1 cites·6 claims
- 0877US9627237B2Apparatus, method and non-transitory storage medium for accommodating and processing a substrateTOKYO ELECTRON LTD·Filed 2014·Granted Apr 18, 2017·4 cites·10 claims
- 0977US8206076B2Substrate processing systemUEDA ISSEI·Filed 2008·Granted Jun 26, 2012·8 cites·15 claims
- 1076US5498294AApparatus and method for washing substratesTOKYO ELECTRON LTD·Filed 1993·Granted Mar 12, 1996·68 cites·10 claims
- 1174US10424499B2Apparatus, method and non-transitory storage medium for accommodating and processing a substrateTOKYO ELECTRON LTD·Filed 2017·Granted Sep 24, 2019·2 cites·4 claims
- 1273US6814809B2Coating and developing apparatus and pattern forming methodTOKYO ELECTRON LTD·Filed 2001·Granted Nov 9, 2004·16 cites·18 claims
- 1371US11699608B2Substrate storage apparatus, substrate storage method, and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Jul 11, 2023·1 cites·8 claims
- 1471US5686143AResist treating methodTOKYO ELECTRON LTD·Filed 1996·Granted Nov 11, 1997·31 cites·6 claims
- 1568US6319322B1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Nov 20, 2001·34 cites·20 claims
- 1668US2024391706A1Substrate transfer apparatus and substrate transfer methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1741US2005042555A1Coating and developing apparatus and pattern forming methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1836US2001055522A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →