Inventor · disambiguated record
Bruno M. Lafontaine
Also filed as: LAFONTAINE BRUNO · LAFONTAINE BRUNO M
21 granted patents·1 pending application·441 citations·filing 2000–2007
95Inventor score
Top patents by PatentIndex Score
22 records- 0195US8198611B2Laser beam formatting module and method for fabricating semiconductor dies using sameLAFONTAINE BRUNO M·Filed 2007·Granted Jun 12, 2012·90 cites·20 claims
- 0295US6977718B1Lithography method and system with adjustable reflectorADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 20, 2005·74 cites·20 claims
- 0393US6984475B1Extreme ultraviolet (EUV) lithography masksADVANCED MICRO DEVICES INC·Filed 2003·Granted Jan 10, 2006·51 cites·20 claims
- 0492US7087907B1Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopyADVANCED MICRO DEVICES INC·Filed 2004·Granted Aug 8, 2006·46 cites·20 claims
- 0586US7081956B1Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging systemADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 25, 2006·27 cites·20 claims
- 0686US7014966B2Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systemsADVANCED MICRO DEVICES INC·Filed 2003·Granted Mar 21, 2006·29 cites·22 claims
- 0785US6806007B1EUV mask which facilitates electro-static chuckingADVANCED MICRO DEVICES INC·Filed 2003·Granted Oct 19, 2004·26 cites·26 claims
- 0882US6589717B1Photon assisted deposition of hard mask formation for use in manufacture of both devices and masksADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 8, 2003·20 cites·20 claims
- 0981US6593037B1EUV mask or reticle having reduced reflectionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·30 cites·22 claims
- 1077US6950176B1Method and system for monitoring EUV lithography mask flatnessADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 27, 2005·20 cites·10 claims
- 1166US7060401B1Phase-shift reflective mask for lithography, and method of using and fabricatingADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 13, 2006·8 cites·37 claims
- 1266US6977717B1Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging systemADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 20, 2005·8 cites·20 claims
- 1366US6673524B2Attenuating extreme ultraviolet (EUV) phase-shifting mask fabrication methodFiled 2001·Granted Jan 6, 2004·8 cites·15 claims
- 1452US7858276B2Method for determining suitability of a resist in semiconductor wafer fabricationADVANCED MICRO DEVICES INC·Filed 2007·Granted Dec 28, 2010·0 cites·19 claims
- 1551US7855048B1Wafer assembly having a contrast enhancing top anti-reflecting coating and method of lithographic processingADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 21, 2010·2 cites·15 claims
- 1647US7504198B2Methods for enhancing resolution of a chemically amplified photoresistADVANCED MICRO DEVICES INC·Filed 2006·Granted Mar 17, 2009·0 cites·25 claims
- 1746US8792161B2Optical polarizer with nanotube arrayLAFONTAINE BRUNO M·Filed 2007·Granted Jul 29, 2014·0 cites·15 claims
- 1846US7741012B1Method for removal of immersion lithography medium in immersion lithography processesADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 22, 2010·1 cites·20 claims
- 1945US2008259458A1EUV diffractive optical element for semiconductor wafer lithography and method for making sameADVANCED MICRO DEVICES INC·Filed 2007·Application pending·0 cites
- 2042US6696847B1Photo assisted electrical linewidth measurement method and apparatusADVANCED MICRO DEVICES INC·Filed 2001·Granted Feb 24, 2004·1 cites·5 claims
- 2140US6664030B1System for and method of constructing an alternating phase-shifting maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 16, 2003·0 cites·20 claims
- 2239US7276328B1Lithography mask utilizing asymmetric light sourceADVANCED MICRO DEVICES INC·Filed 2004·Granted Oct 2, 2007·0 cites·18 claims
Join the waitlist — get patent alerts
Get an alert when Bruno M. Lafontaine files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →