Inventor · disambiguated record
Ranga Rao Arnepalli
Also filed as: ARNEPALLI RANGA RAO
13 granted patents·10 pending applications·457 citations·filing 2011–2022
90Inventor score
Top patents by PatentIndex Score
23 records- 0197US10017856B1Flowable gapfill using solventsAPPLIED MATERIALS INC·Filed 2017·Granted Jul 10, 2018·340 cites·10 claims
- 0296US10043684B1Self-limiting atomic thermal etching systems and methodsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 7, 2018·96 cites·20 claims
- 0389US9673042B2Methods and apparatus for in-situ cleaning of copper surfaces and deposition and removal of self-assembled monolayersAPPLIED MATERIALS INC·Filed 2015·Granted Jun 6, 2017·6 cites·20 claims
- 0485US8846437B2High efficiency thin film transistor device with gallium arsenide layerSINGH KAUSHAL K·Filed 2011·Granted Sep 30, 2014·9 cites·15 claims
- 0576US10273577B2Low vapor pressure aerosol-assisted CVDAPPLIED MATERIALS INC·Filed 2016·Granted Apr 30, 2019·2 cites·15 claims
- 0675US10515927B2Methods and apparatus for semiconductor package processingAPPLIED MATERIALS INC·Filed 2017·Granted Dec 24, 2019·2 cites·17 claims
- 0774US11980992B2Integrated abrasive polishing pads and manufacturing methodsAPPLIED MATERIALS INC·Filed 2022·Granted May 14, 2024·0 cites·19 claims
- 0874US11471999B2Integrated abrasive polishing pads and manufacturing methodsAPPLIED MATERIALS INC·Filed 2018·Granted Oct 18, 2022·1 cites·14 claims
- 0970US10319601B2Slurry for polishing of integrated circuit packagingAPPLIED MATERIALS INC·Filed 2017·Granted Jun 11, 2019·1 cites·15 claims
- 1055US10280507B2Flowable gapfill using solventsAPPLIED MATERIALS INC·Filed 2018·Granted May 7, 2019·0 cites·18 claims
- 1151US2018347039A1Aerosol Assisted CVD For Industrial CoatingsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1249US11598000B2Method, materials and process for native oxide removal and regrowth of dielectric oxides for better biosensor performanceAPPLIED MATERIALS INC·Filed 2018·Granted Mar 7, 2023·0 cites·16 claims
- 1344US10326067B2Methods to synthesize single source precursors and methods to deposit nanowire based thin films for high efficiency thermoelectric devicesAPPLIED MATERIALS INC·Filed 2015·Granted Jun 18, 2019·0 cites·11 claims
- 1442US10163629B2Low vapor pressure aerosol-assisted CVDAPPLIED MATERIALS INC·Filed 2016·Granted Dec 25, 2018·0 cites·17 claims
- 1542US2016339517A1Powders for additive manufacturingAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 1642US2018236633A1Slurry and Slurry Delivery Technique for Chemical Mechanical Polishing of CopperAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 1741US2016040040A1Slurry for Selective Chemical Mechanical Polishing of CopperAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 1839US2018350604A1Selective Deposition And Etching Of Metal Pillars Using AACVD And An Electrical BiasAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1938US2018363133A1Method and Apparatus for Void Free SiN GapfillAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2036US2018080124A1Methods and systems for thermal ale and aldAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 2135US2018330929A1In-situ removal of accumulated process byproducts from components of a semiconductor processing chamberAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2233US2018033643A1Methods and apparatus for using alkyl amines for the selective removal of metal nitrideAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 2331US2017298252A1Nanoparticle based cerium oxide slurriesAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →