Inventor · disambiguated record
Kazuyuki Mitsuoka
Also filed as: MITSUOKA KAZUYUKI
18 granted patents·4 pending applications·56 citations·filing 2003–2017
92Inventor score
Top patents by PatentIndex Score
22 records- 0188US10115609B2Separation and regeneration apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 30, 2018·6 cites·8 claims
- 0287US9953840B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2016·Granted Apr 24, 2018·5 cites·11 claims
- 0384US9881784B2Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 30, 2018·4 cites·12 claims
- 0484US9662685B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted May 30, 2017·5 cites·5 claims
- 0583US10046370B2Substrate processing apparatus, substrate processing method, fluid supplying method and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 14, 2018·3 cites·3 claims
- 0681US8372212B2Supercritical drying method and apparatus for semiconductor substratesTOSHIBA KK·Filed 2012·Granted Feb 12, 2013·5 cites·5 claims
- 0780US8465596B2Supercritical processing apparatus and supercritical processing methodTOSHIMA TAKAYUKI·Filed 2011·Granted Jun 18, 2013·5 cites·9 claims
- 0879US8771429B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusJI LINAN·Filed 2012·Granted Jul 8, 2014·5 cites·8 claims
- 0973US9583330B2Supercritical drying method for semiconductor substrate and supercritical drying apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Feb 28, 2017·2 cites·4 claims
- 1070US7005660B2Surface processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 28, 2006·8 cites·17 claims
- 1164US10207349B2High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure containerTOKYO ELECTRON LTD·Filed 2013·Granted Feb 19, 2019·1 cites·14 claims
- 1263US10096462B2Substrate processing method and storage mediumTOSHIBA KK·Filed 2013·Granted Oct 9, 2018·1 cites·7 claims
- 1362US10199240B2Substrate processing method, substrate processing apparatus, and storage mediumHAYASHI HIDEKAZU·Filed 2012·Granted Feb 5, 2019·1 cites·7 claims
- 1457US8168377B2Pattern forming method and method of manufacturing semiconductor device by using the sameMITSUOKA KAZUYUKI·Filed 2009·Granted May 1, 2012·1 cites·19 claims
- 1554US7195936B2Thin film processing method and systemTOKYO ELECTRON LTD·Filed 2003·Granted Mar 27, 2007·4 cites·7 claims
- 1645US7473567B2Change rate prediction method, storage medium, and substrate processing systemTOKYO ELECTRON LTD·Filed 2007·Granted Jan 6, 2009·0 cites·10 claims
- 1742US7348129B2Electron beam processing method and apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Mar 25, 2008·0 cites·10 claims
- 1838US7521098B2Method of processing an organic-filmTOKYO ELECTRON LTD·Filed 2003·Granted Apr 21, 2009·0 cites·12 claims
- 1936US2017076938A1Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2036US2017011907A1Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2134US2015258466A1Separation and regeneration apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2234US2015258584A1Separation and regeneration apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →