Inventor · disambiguated record
Tobias Mono
Also filed as: MONO TOBIAS
15 granted patents·8 pending applications·147 citations·filing 2000–2023
93Inventor score
Files withINFINEON TECHNOLOGIES AG14QIMONDA AG4FITZ CLEMENS1GOLDBACH MATTHIAS1INFINEON TECHNOLOGIES CORP1
Top patents by PatentIndex Score
23 records- 0193US7863136B2Method of manufacturing integrated circuits including a FET with a gate spacer and a finQIMONDA AG·Filed 2008·Granted Jan 4, 2011·35 cites·15 claims
- 0289US7622354B2Integrated circuit and method of manufacturing an integrated circuitQIMONDA AG·Filed 2007·Granted Nov 24, 2009·21 cites·10 claims
- 0377US6897943B2Method and apparatus for aerial image improvement in projection lithography using a phase shifting apertureINFINEON TECHNOLOGIES AG·Filed 2000·Granted May 24, 2005·20 cites·24 claims
- 0471US7618867B2Method of forming a doped portion of a semiconductor and method of forming a transistorINFINEON TECHNOLOGIES AG·Filed 2006·Granted Nov 17, 2009·5 cites·25 claims
- 0569US7718475B2Method for manufacturing an integrated circuit including a transistorQIMONDA AG·Filed 2007·Granted May 18, 2010·4 cites·24 claims
- 0667US6605396B2Resolution enhancement for alternating phase shift masksINFINEON TECHNOLOGIES AG·Filed 2001·Granted Aug 12, 2003·9 cites·31 claims
- 0766US7871943B2Method of making transistor gates with controlled work functionQIMONDA AG·Filed 2008·Granted Jan 18, 2011·2 cites·13 claims
- 0865US7049241B2Method for forming a trench in a layer or a layer stack on a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted May 23, 2006·9 cites·20 claims
- 0962US6551874B2Self-aligned STI process using nitride hard maskINFINEON TECHNOLOGIES AG·Filed 2001·Granted Apr 22, 2003·12 cites·21 claims
- 1059US6828647B2Structure for determining edges of regions in a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2001·Granted Dec 7, 2004·8 cites·4 claims
- 1159US6440759B1Method of measuring combined critical dimension and overlay in single stepINFINEON TECHNOLOGIES AG·Filed 2001·Granted Aug 27, 2002·10 cites·9 claims
- 1257US12471396B2Image sensor deviceINFINEON TECHNOLOGIES AG·Filed 2022·Granted Nov 11, 2025·0 cites·21 claims
- 1357US6579650B2Method and apparatus for determining photoresist pattern linearityINFINEON TECHNOLOGIES AG·Filed 2001·Granted Jun 17, 2003·2 cites·22 claims
- 1456US2024128295A1Optical sensor and method for fabricating an optical sensorINFINEON TECHNOLOGIES AG·Filed 2023·Application pending·0 cites
- 1554US7107562B2Method and apparatus for the arrangement of contact-making elements of components of an integrated circuit, computer-readable storage medium and program elementINFINEON TECHNOLOGIES AG·Filed 2003·Granted Sep 12, 2006·4 cites·15 claims
- 1654US2023124062A1Heteroepitaxial semiconductor device and method for fabricating a heteroepitaxial semiconductor deviceINFINEON TECHNOLOGIES AG·Filed 2022·Application pending·0 cites
- 1754US2023317745A1Optical sensor and method for fabricating an optical sensorINFINEON TECHNOLOGIES AG·Filed 2023·Application pending·0 cites
- 1851US6566227B2Strap resistance using selective oxidation to cap DT poly before STI etchINFINEON TECHNOLOGIES AG·Filed 2001·Granted May 20, 2003·6 cites·24 claims
- 1940US2009159976A1Integrated circuit and method for making an integrated circuitGOLDBACH MATTHIAS·Filed 2007·Application pending·0 cites
- 2036US2008230839A1Method of producing a semiconductor structureREGUL JOERN·Filed 2007·Application pending·0 cites
- 2135US2002192926A1High contrast lithography alignment marks for semiconductor manufacturingFiled 2001·Application pending·0 cites
- 2234US2004058550A1Dummy patterns for reducing proximity effects and method of using sameINFINEON TECHNOLOGIES CORP·Filed 2002·Application pending·0 cites
- 2332US2008124920A1Fabrication method for an integrated circuit structureFITZ CLEMENS·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →