Inventor · disambiguated record
Ezra Robert Gold
Also filed as: GOLD EZRA · GOLD EZRA R · GOLD EZRA ROBERT
27 granted patents·16 pending applications·727 citations·filing 2006–2024
95Inventor score
Top patents by PatentIndex Score
43 records- 0198US8231799B2Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zoneBERA KALLOL·Filed 2006·Granted Jul 31, 2012·557 cites·18 claims
- 0295US7846497B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Dec 7, 2010·37 cites·21 claims
- 0393US7775236B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·25 cites·20 claims
- 0490US7975558B2Method and apparatus for gas flow measurementAPPLIED MATERIALS INC·Filed 2010·Granted Jul 12, 2011·9 cites·22 claims
- 0590US7431859B2Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulationAPPLIED MATERIALS INC·Filed 2006·Granted Oct 7, 2008·18 cites·16 claims
- 0689US7540971B2Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas contentAPPLIED MATERIALS INC·Filed 2006·Granted Jun 2, 2009·16 cites·19 claims
- 0787US9565732B2Lighting nodes having a core node and sensor podsSENSITY SYSTEMS INC·Filed 2016·Granted Feb 7, 2017·6 cites·24 claims
- 0887US8074677B2Method and apparatus for controlling gas flow to a processing chamberGOLD EZRA ROBERT·Filed 2007·Granted Dec 13, 2011·19 cites·20 claims
- 0987US7743670B2Method and apparatus for gas flow measurementAPPLIED MATERIALS INC·Filed 2007·Granted Jun 29, 2010·10 cites·20 claims
- 1087US7541292B2Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zonesAPPLIED MATERIALS INC·Filed 2006·Granted Jun 2, 2009·12 cites·21 claims
- 1176US8048806B2Methods to avoid unstable plasma states during a process transitionAPPLIED MATERIALS INC·Filed 2006·Granted Nov 1, 2011·5 cites·13 claims
- 1276US2025246037A1System and method for provisioning a facial recognition-based system for controlling access to a buildingALCATRAZ AI INC·Filed 2024·Application pending·0 cites
- 1374US7452824B2Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parametersAPPLIED MATERIALS INC·Filed 2006·Granted Nov 18, 2008·3 cites·17 claims
- 1473US8931512B2Gas delivery system and method of use thereofCRUSE JAMES P·Filed 2012·Granted Jan 13, 2015·5 cites·18 claims
- 1572US8895889B2Methods and apparatus for rapidly responsive heat control in plasma processing devicesAPPLIED MATERIALS INC·Filed 2013·Granted Nov 25, 2014·2 cites·8 claims
- 1670US7901952B2Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parametersAPPLIED MATERIALS INC·Filed 2006·Granted Mar 8, 2011·2 cites·16 claims
- 1765US7470626B2Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressureAPPLIED MATERIALS INC·Filed 2006·Granted Dec 30, 2008·1 cites·22 claims
- 1858US2021287469A1System and method for provisioning a facial recognition-based system for controlling access to a buildingALCATRAZ AI INC·Filed 2020·Application pending·0 cites
- 1955US12237682B2Efficient hierarchical distributed power storageBREAKEATS LLC·Filed 2020·Granted Feb 25, 2025·0 cites·20 claims
- 2055US9587789B2Methods and apparatus for providing a gas mixture to a pair of process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Mar 7, 2017·0 cites·18 claims
- 2155US9155134B2Methods and apparatus for rapidly responsive heat control in plasma processing devicesZHANG CHUNLEI·Filed 2008·Granted Oct 6, 2015·0 cites·16 claims
- 2253US11359769B2Gas cartridge loaded dispensing deviceBREAKEATS LLC·Filed 2019·Granted Jun 14, 2022·0 cites·18 claims
- 2352US7910013B2Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressureAPPLIED MATERIALS INC·Filed 2006·Granted Mar 22, 2011·0 cites·19 claims
- 2452US2009250335A1Method of controlling plasma distribution uniformity by superposition of different constant solenoid fieldsHOFFMAN DANIEL J·Filed 2008·Application pending·0 cites
- 2552US2009250432A1Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fieldsHOFFMAN DANIEL J·Filed 2008·Application pending·0 cites
- 2651US9848474B2Lighting nodes having a core node and sensor podsSENSITY SYSTEMS INC·Filed 2016·Granted Dec 19, 2017·0 cites·17 claims
- 2749US7795153B2Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parametersAPPLIED MATERIALS INC·Filed 2006·Granted Sep 14, 2010·0 cites·12 claims
- 2848US9088357B2Imaging system for passive alignment of enginesAPPLIED MICRO CIRCUITS CORP·Filed 2012·Granted Jul 21, 2015·0 cites·15 claims
- 2947US8616224B2Methods and apparatus for providing a gas mixture to a pair of process chambersLEE JARED AHMAD·Filed 2010·Granted Dec 31, 2013·0 cites·9 claims
- 3047US2011265951A1Twin chamber processing systemAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3146US2009272717A1Method and apparatus of a substrate etching system and processAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3245US2008187147A1Noise reduction systems and methodsBERNER MIRANDA S·Filed 2007·Application pending·0 cites
- 3343US2007254483A1Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformityAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3442US2014293603A1Led light bulb replacement with adjustable light distributionSENSITY SYSTEMS INC·Filed 2014·Application pending·0 cites
- 3542US2007048882A1Method to reduce plasma-induced charging damageAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3641US8562742B2Apparatus for radial delivery of gas to a chamber and methods of use thereofLEE JARED AHMAD·Filed 2010·Granted Oct 22, 2013·0 cites·20 claims
- 3741US2021126460A1Efficient hierarchical distributed power storageBREAKEATS LLC·Filed 2019·Application pending·0 cites
- 3841US2014086533A1Method for alignment between two optical componentsGOLD EZRA·Filed 2012·Application pending·0 cites
- 3940US2014082935A1Method for passive alignment of optical components to a substrateVOLEX PLC·Filed 2012·Application pending·0 cites
- 4039US8616043B2Methods and apparatus for calibrating pressure gauges in a substrate processing systemCRUSE JAMES P·Filed 2010·Granted Dec 31, 2013·0 cites·18 claims
- 4138US2011265883A1Methods and apparatus for reducing flow splitting errors using orifice ratio conductance controlAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4237US2011151590A1Apparatus and method for low-k dielectric repairAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 4336US2016125246A1System and method for parking and traffic analysisRYHORCHUK KENT W·Filed 2015·Application pending·0 cites
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