Inventor · disambiguated record
Michael Layh
Also filed as: LAYH MICHAEL
33 granted patents·6 pending applications·101 citations·filing 2008–2020
96Inventor score
Top patents by PatentIndex Score
39 records- 0198US9599904B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Mar 21, 2017·15 cites·20 claims
- 0296US9013684B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2012·Granted Apr 21, 2015·17 cites·18 claims
- 0391US9176390B2Method for adjusting an illumination system of a projection exposure apparatus for projection lithographyLAYH MICHAEL·Filed 2012·Granted Nov 3, 2015·8 cites·21 claims
- 0488US8467031B2Illumination system for illuminating a mask in a microlithographic exposure apparatusSCHUBERT ERICH·Filed 2010·Granted Jun 18, 2013·6 cites·28 claims
- 0587US9310694B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Apr 12, 2016·3 cites·27 claims
- 0687US8724086B2Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisationLAYH MICHAEL·Filed 2010·Granted May 13, 2014·4 cites·24 claims
- 0787US8705005B2Microlithographic illumination systemDEGUENTHER MARKUS·Filed 2008·Granted Apr 22, 2014·9 cites·49 claims
- 0885US8339577B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusXALTER STEFAN·Filed 2009·Granted Dec 25, 2012·9 cites·31 claims
- 0982US10191382B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jan 29, 2019·1 cites·18 claims
- 1080US9897925B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 20, 2018·1 cites·18 claims
- 1178US8891057B2Microlithographic projection exposure apparatusLAYH MICHAEL·Filed 2010·Granted Nov 18, 2014·2 cites·21 claims
- 1277US7880969B2Optical integrator for an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Feb 1, 2011·4 cites·20 claims
- 1376US9310692B2Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatusSTUETZLE RALF·Filed 2010·Granted Apr 12, 2016·3 cites·35 claims
- 1475US9007559B2EUV collector with cooling deviceLAYH MICHAEL·Filed 2011·Granted Apr 14, 2015·4 cites·13 claims
- 1573US9239229B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Jan 19, 2016·1 cites·13 claims
- 1672US8786849B2Method for measuring an optical systemZEISS CARL SMT GMBH·Filed 2013·Granted Jul 22, 2014·2 cites·31 claims
- 1771US10241416B2Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Mar 26, 2019·1 cites·19 claims
- 1871US9658533B2Arrangement of a mirrorZEISS CARL SMT GMBH·Filed 2014·Granted May 23, 2017·2 cites·19 claims
- 1969US9217930B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Dec 22, 2015·1 cites·25 claims
- 2069US8520307B2Optical integrator for an illumination system of a microlithographic projection exposure apparatusWOLF OLIVER·Filed 2010·Granted Aug 27, 2013·4 cites·48 claims
- 2168US9007563B2Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatusDEGUENTHER MARKUS·Filed 2010·Granted Apr 14, 2015·1 cites·28 claims
- 2268US8395756B2Illumination system for a microlithographic projection exposure apparatusWANGLER JOHANNES·Filed 2008·Granted Mar 12, 2013·2 cites·49 claims
- 2366US9001309B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 7, 2015·0 cites·30 claims
- 2465US2018246415A1Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2562US10114293B2Illumination system and projection objective of a mask inspection apparatusFELDMANN HEIKO·Filed 2012·Granted Oct 30, 2018·1 cites·45 claims
- 2662US9977333B2Illumination system for illuminating a mask in a microlithographic exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted May 22, 2018·0 cites·12 claims
- 2761US2014211188A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 2860US9019475B2Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Apr 28, 2015·0 cites·26 claims
- 2957US9341953B2Microlithographic illumination systemZEISS CARL SMT GMBH·Filed 2014·Granted May 17, 2016·0 cites·25 claims
- 3056US9575414B2Illumination system for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Feb 21, 2017·0 cites·22 claims
- 3155US10146135B2Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisationZEISS CARL SMT GMBH·Filed 2015·Granted Dec 4, 2018·0 cites·20 claims
- 3249US2009262324A1Illumination optics for projection microlithography and related methodsZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 3343US9933704B2Microlithography illumination optical system and microlithography projection exposure apparatus including sameZEISS CARL SMT GMBH·Filed 2012·Granted Apr 3, 2018·0 cites·19 claims
- 3443US9304400B2Illumination system for EUV microlithographyLAYH MICHAEL·Filed 2011·Granted Apr 5, 2016·0 cites·34 claims
- 3543US2013176546A1Illumination optical unit with a movable filter elementLAYH MICHAEL·Filed 2013·Application pending·0 cites
- 3641US2012153189A1Optical system for generating a light beam for treating a substrateWANGLER JOHANNES·Filed 2012·Application pending·0 cites
- 3738US8537335B2Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical systemSCHWAB MARKUS·Filed 2010·Granted Sep 17, 2013·0 cites·26 claims
- 3837US2021086250A1Method for operating a processing installation with a movable punchDONHAUSER CHRISTIAN·Filed 2018·Application pending·0 cites
- 3933US12235094B2Confocal measuring apparatus for 3D measurement of an object surfaceHOCHSCHULE FUER ANGEWANDTE WSS KEMPTEN KOERPERSCHAFT DES OEFFENTLICHEN RECHTS·Filed 2020·Granted Feb 25, 2025·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →