Inventor · disambiguated record
Kuei-Shun Chen
Also filed as: CHEN KUEI-SHUN
111 granted patents·15 pending applications·763 citations·filing 2001–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD60TAIWAN SEMICONDUCTOR MFG32LIU CHIA-CHU8LIU GEORGE8CHEN KUEI SHUN4
Top patents by PatentIndex Score
126 records- 0198US7202148B2Method utilizing compensation features in semiconductor processingTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Apr 10, 2007·379 cites·17 claims
- 0297US10282504B2Method for improving circuit layout for manufacturabilityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 7, 2019·31 cites·20 claims
- 0396US9418868B1Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 16, 2016·11 cites·20 claims
- 0496US8906595B2Method for improving resist pattern peelingTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Dec 9, 2014·52 cites·17 claims
- 0596US8732626B2System and method of circuit layout for multiple cellsLIU CHIA-CHU·Filed 2012·Granted May 20, 2014·33 cites·20 claims
- 0695US9946827B2Method and structure for mandrel and spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 17, 2018·15 cites·18 claims
- 0794US10049918B2Directional patterning methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 14, 2018·9 cites·20 claims
- 0893US11791161B2Pattern fidelity enhancementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 17, 2023·2 cites·20 claims
- 0993US10658184B2Pattern fidelity enhancement with directional patterning technologyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 19, 2020·7 cites·12 claims
- 1092US10861698B2Pattern fidelity enhancementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 8, 2020·5 cites·19 claims
- 1192US9059001B2Semiconductor device with biased featureLIU CHIA-CHU·Filed 2012·Granted Jun 16, 2015·12 cites·20 claims
- 1291US8822343B2Enhanced FinFET process overlay markHSIEH CHI-WEN·Filed 2012·Granted Sep 2, 2014·14 cites·13 claims
- 1390US9947764B2Dummy gate structure and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Apr 17, 2018·5 cites·19 claims
- 1490US9786569B1Overlay measurement and compensation in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Oct 10, 2017·12 cites·20 claims
- 1590US8431291B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Apr 30, 2013·5 cites·16 claims
- 1689US10418460B2Dummy gate structure and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 17, 2019·4 cites·20 claims
- 1789US9941125B2Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 10, 2018·6 cites·20 claims
- 1889US9184101B2Method for removing semiconductor fins using alternating masksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Nov 10, 2015·10 cites·20 claims
- 1988US7767570B2Dummy vias for damascene processTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Aug 3, 2010·15 cites·14 claims
- 2087US12394633B2Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Aug 19, 2025·0 cites·20 claims
- 2187US10163654B2Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·3 cites·8 claims
- 2287US9431513B2Dummy gate structure and methods thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Aug 30, 2016·6 cites·20 claims
- 2387US2025308892A1Pattern fidelity enhancementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2487US2025322133A1Method and structure for mandrel and spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 2586US11010526B2Method and structure for mandrel and spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 18, 2021·2 cites·20 claims
- 2686US9684236B1Method of patterning a film layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 20, 2017·4 cites·20 claims
- 2785US12334342B2Pattern fidelity enhancementTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jun 17, 2025·0 cites·20 claims
- 2885US10073354B2Exposure method of wafer substrate, manufacturing method of semiconductor device, and exposure toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 11, 2018·3 cites·20 claims
- 2985US8932936B2Method of forming a FinFET deviceLIU CHIA-CHU·Filed 2012·Granted Jan 13, 2015·9 cites·19 claims
- 3085US8850369B2Metal cut process flowLUNG YUAN-HSIANG·Filed 2012·Granted Sep 30, 2014·12 cites·20 claims
- 3184US10727061B2Method for integrated circuit patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 28, 2020·3 cites·20 claims
- 3284US7960821B2Dummy vias for damascene processTAIWAN SEMICONDUCTOR MFG·Filed 2010·Granted Jun 14, 2011·6 cites·20 claims
- 3382US11003091B2Method of fabricating reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted May 11, 2021·1 cites·20 claims
- 3482US8158306B2Method and system for combining photomasks to form semiconductor devicesCHEN KUEI SHUN·Filed 2010·Granted Apr 17, 2012·3 cites·13 claims
- 3581US8846302B2Semiconductor structure and method and tool for forming the semiconductor structureLIU GEORGE·Filed 2012·Granted Sep 30, 2014·5 cites·19 claims
- 3680US2025359313A1Field effect transistor with isolation structure and related methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 3779US11894238B2Method of fabricating semiconductor device with reduced trench distortionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 6, 2024·0 cites·20 claims
- 3879US8394576B2Method for patterning a photosensitive layerLU HSIAO-TZU·Filed 2012·Granted Mar 12, 2013·2 cites·20 claims
- 3979US7501227B2System and method for photolithography in semiconductor manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Mar 10, 2009·4 cites·20 claims
- 4078US12412016B2Method and structure for mandrel and spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 9, 2025·0 cites·20 claims
- 4177US10534272B2Method of fabricating reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jan 14, 2020·1 cites·20 claims
- 4277US7648918B2Method of pattern formation in semiconductor fabricationTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jan 19, 2010·4 cites·18 claims
- 4376US10146141B2Lithography process and system with enhanced overlay qualityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 4, 2018·2 cites·20 claims
- 4476US8969922B2Field effect transistors and method of forming the sameLIU CHIA-CHU·Filed 2012·Granted Mar 3, 2015·5 cites·17 claims
- 4576US8003303B2Intensity selective exposure method and apparatusTAIWAN SEMICONDUCTOR MFG·Filed 2009·Granted Aug 23, 2011·4 cites·18 claims
- 4676US2024387708A1Method of manufacturing a semiconductor device and semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4775US11940737B2Method of fabricating reticleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 26, 2024·0 cites·20 claims
- 4875US9412649B1Method of fabricating semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Aug 9, 2016·2 cites·20 claims
- 4974US11748540B2Method and structure for mandrel and spacer patterningTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Sep 5, 2023·0 cites·20 claims
- 5074US8119533B2Pattern formation in semiconductor fabricationLIU GEORGE·Filed 2009·Granted Feb 21, 2012·3 cites·20 claims
Showing the top 50 of 126 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →