Inventor · disambiguated record

Michael Awdshiew

Also filed as: AWDSHIEW MICHAEL

1 granted patent·284 citations·filing 2002–2002

57Inventor score

Technology areasC23C

Files withAPPLIED MATERIALS INC1

Top patents by PatentIndex Score

1 record

0195US6802944B2High density plasma CVD process for gapfill into high aspect ratio featuresAPPLIED MATERIALS INC·Filed 2002·Granted Oct 12, 2004·284 cites·31 claims

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