Inventor · disambiguated record
Akimasa Soyano
Also filed as: SOYANO AKIMASA
6 granted patents·3 pending applications·80 citations·filing 2001–2012
82Inventor score
Top patents by PatentIndex Score
9 records- 0193US7510817B2Photoresist polymer compositionsJSR CORP·Filed 2005·Granted Mar 31, 2009·21 cites·21 claims
- 0283US8507575B2Radiation-sensitive resin composition, polymer, and compoundMATSUMURA NOBUJI·Filed 2011·Granted Aug 13, 2013·7 cites·22 claims
- 0379US9261780B2Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compoundASANO YUSUKE·Filed 2011·Granted Feb 16, 2016·3 cites·21 claims
- 0475US6623907B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Sep 23, 2003·35 cites·12 claims
- 0556US6800419B2Radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Oct 5, 2004·14 cites·19 claims
- 0643US2008213689A1Watermark defect reduction by resist optimizationIMEC INTER UNI MICRO ELECTR·Filed 2007·Application pending·0 cites
- 0737US2011151378A1Radiation-sensitive resin composition for liquid immersion lithography, polymer, and resist pattern-forming methodJSR CORP·Filed 2010·Application pending·0 cites
- 0836US2011143279A1Radiation-sensitive resin compositionJSR CORP·Filed 2011·Application pending·0 cites
- 0933US8916333B2Radiation-sensitive resin compositionJSR CORP·Filed 2012·Granted Dec 23, 2014·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →