Inventor · disambiguated record
Pavel Bulkin
Also filed as: BULKIN PAVEL
7 granted patents·4 pending applications·40 citations·filing 2006–2018
76Inventor score
Top patents by PatentIndex Score
11 records- 0193US7964438B2Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasmaDOW CORNING·Filed 2007·Granted Jun 21, 2011·37 cites·13 claims
- 0266US8349412B2Deposition of amorphous silicon films by electron cyclotron resonanceECOLE POLYTECH·Filed 2006·Granted Jan 8, 2013·2 cites·8 claims
- 0363US8383210B2Method of forming a film by deposition from a plasmaDOW CORNING EUROP S A·Filed 2007·Granted Feb 26, 2013·1 cites·15 claims
- 0453US8859929B2Method and apparatus for forming a film by deposition from a plasmaROCA I CABARROCAS PERE·Filed 2007·Granted Oct 14, 2014·0 cites·13 claims
- 0550US7998785B2Film deposition of amorphous films with a graded bandgap by electron cyclotron resonanceDOW CORNING·Filed 2007·Granted Aug 16, 2011·0 cites·20 claims
- 0649US2010074807A1Apparatus for generating a plasmaECOLE POLYTECH·Filed 2008·Application pending·0 cites
- 0745US2010075065A1Film deposition of amorphous films by electron cyclotron resonanceDOW CORNING·Filed 2007·Application pending·0 cites
- 0843US8635972B2Device for forming a film by deposition from a plasmaROCA I CABARROCAS PERE·Filed 2007·Granted Jan 28, 2014·0 cites·6 claims
- 0941US2018254170A1Plasma generating apparatus and method of manufacturing patterned devices using spatially resolved plasma processingTOTAL SA·Filed 2016·Application pending·0 cites
- 1037US2014338744A1Process For Texturing The Surface Of A Silicon Substrate, Structured Substrate And Photovoltaic Device Comprising Such A Structured SubstrateTOTAL MARKETING SERVICES·Filed 2012·Application pending·0 cites
- 1135US11600739B2Apparatus and method for patterned processingTOTAL SA·Filed 2018·Granted Mar 7, 2023·0 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Pavel Bulkin files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →