Inventor · disambiguated record
Jan-Wen You
Also filed as: YOU JAN-WEN
9 granted patents·1 pending application·81 citations·filing 2002–2006
87Inventor score
Files withTAIWAN SEMICONDUCTOR MFG10
Top patents by PatentIndex Score
10 records- 0189US6711732B1Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution eraTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Mar 23, 2004·25 cites·10 claims
- 0283US7234128B2Method for improving the critical dimension uniformity of patterned features on wafersTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jun 19, 2007·21 cites·38 claims
- 0383US7131102B2Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution eraTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Oct 31, 2006·15 cites·14 claims
- 0479US7643976B2Method and system for identifying lens aberration sensitive patterns in an integrated circuit chipTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jan 5, 2010·6 cites·21 claims
- 0570US6973636B2Method of defining forbidden pitches for a lithography exposure toolTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Dec 6, 2005·12 cites·29 claims
- 0650US7036108B2Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution eraTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Apr 25, 2006·1 cites·11 claims
- 0750US7013453B2Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERATAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Mar 14, 2006·1 cites·10 claims
- 0843US7474788B2Method and system for enhancing image resolution using a modification vectorTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Jan 6, 2009·0 cites·36 claims
- 0942US2007087291A1Lithography process to reduce interferenceTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 1038US7175941B2Phase shift assignments for alternate PSMTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Feb 13, 2007·0 cites·38 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →