Inventor · disambiguated record
Kotaro Miyatani
Also filed as: MIYATANI KOTARO
5 granted patents·7 pending applications·151 citations·filing 1999–2022
79Inventor score
Top patents by PatentIndex Score
12 records- 0190US6776874B2Processing method and apparatus for removing oxide filmTOKYO ELECTRON LTD·Filed 2000·Granted Aug 17, 2004·52 cites·19 claims
- 0289US6706334B1Processing method and apparatus for removing oxide filmTOKYO ELECTRON LTD·Filed 1999·Granted Mar 16, 2004·95 cites·13 claims
- 0366US8383519B2Etching method and recording mediumTOKYO ELECTRON LTD·Filed 2008·Granted Feb 26, 2013·4 cites·9 claims
- 0461US2023137865A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0548US8021975B2Plasma processing method for forming a film and an electronic component manufactured by the methodTOKYO ELECTRON LTD·Filed 2007·Granted Sep 20, 2011·0 cites·19 claims
- 0647US2009202720A1Film Forming and Cleaning MethodMIYATANI KOTARO·Filed 2006·Application pending·0 cites
- 0745US2009053895A1Film forming method of porous film and computer-readable recording mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 0841US9640388B2Method for forming insulating film and method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2016·Granted May 2, 2017·0 cites·19 claims
- 0939US2022068637A1Film-forming method, film-forming apparatus, and oxidation methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1039US2015170963A1Semiconductor device manufacturing methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1132US2013130513A1Interlayer insulating layer forming method and semiconductor deviceMIYATANI KOTARO·Filed 2011·Application pending·0 cites
- 1227US2017092588A1Film forming method, semiconductor device manufacturing method, and semiconductor deviceZEON CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →