Inventor · disambiguated record
Johan Maria Van Boxmeer
Also filed as: VAN BOXMEER JOHAN MARIA
5 granted patents·1 pending application·11 citations·filing 2004–2019
72Inventor score
Top patents by PatentIndex Score
6 records- 0178US10488765B2Method of optimizing the position and/or size of a measurement illumination spot relative to a target on a substrate, and associated apparatusASML NETHERLANDS BV·Filed 2018·Granted Nov 26, 2019·2 cites·13 claims
- 0274US7869022B2Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring systemASML NETHERLANDS BV·Filed 2007·Granted Jan 11, 2011·4 cites·17 claims
- 0354US8994921B2Scatterometer and lithographic apparatusVAN BOXMEER JOHAN MARIA·Filed 2009·Granted Mar 31, 2015·2 cites·16 claims
- 0452US7835017B2Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Nov 16, 2010·3 cites·28 claims
- 0551US10571363B2Method of determining an optimal focus height for a metrology apparatusASML NETHERLANDS BV·Filed 2019·Granted Feb 25, 2020·0 cites·20 claims
- 0640US2011102774A1Focus Sensor, Inspection Apparatus, Lithographic Apparatus and Control SystemASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →