Inventor · disambiguated record
Leon Martin Levasier
Also filed as: LEVASIER LEON M · LEVASIER LEON MARTIN
26 granted patents·7 pending applications·721 citations·filing 2001–2023
97Inventor score
Files withASML NETHERLANDS BV27NIENHUYS HAN-KWANG2DE JONG FREDERIK EDUARD1KNIJN PAULUS JOHANNES1LOOPSTRA ERIK ROELOF1
Top patents by PatentIndex Score
33 records- 0198US7880901B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2010·Granted Feb 1, 2011·63 cites·10 claims
- 0298US7859686B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2009·Granted Dec 28, 2010·61 cites·15 claims
- 0398US7528965B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2007·Granted May 5, 2009·69 cites·14 claims
- 0498US7408655B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2007·Granted Aug 5, 2008·72 cites·16 claims
- 0598US7292312B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2005·Granted Nov 6, 2007·139 cites·16 claims
- 0698US7256871B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2004·Granted Aug 14, 2007·146 cites·16 claims
- 0795US6710849B2Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a methodASML NETHERLANDS BV·Filed 2001·Granted Mar 23, 2004·74 cites·10 claims
- 0892US11422476B2Methods and apparatus for monitoring a lithographic manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Aug 23, 2022·2 cites·20 claims
- 0991US8730448B2Lithographic apparatus and device manufacturing methodNIENHUYS HAN-KWANG·Filed 2012·Granted May 20, 2014·9 cites·19 claims
- 1090US9983489B2Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiationASML NETHERLANDS BV·Filed 2015·Granted May 29, 2018·5 cites·21 claims
- 1187US6995831B2Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structureASML NETHERLANDS BV·Filed 2005·Granted Feb 7, 2006·8 cites·8 claims
- 1282US7542127B2Lithographic apparatus and method for manufacturing a deviceASML NETHERLANDS BV·Filed 2005·Granted Jun 2, 2009·7 cites·29 claims
- 1381US7271917B2Lithographic apparatus, position quantity detection system and methodASML NETHERLANDS BV·Filed 2005·Granted Sep 18, 2007·9 cites·18 claims
- 1479US7002667B2Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Feb 21, 2006·15 cites·48 claims
- 1575US8368902B2Lithographic apparatus and method for calibrating the sameASML NETHERLANDS BV·Filed 2010·Granted Feb 5, 2013·1 cites·16 claims
- 1673US8514365B2Lithographic apparatus and device manufacturing methodDE JONG FREDERIK EDUARD·Filed 2007·Granted Aug 20, 2013·5 cites·20 claims
- 1768US7239368B2Using unflatness information of the substrate table or mask table for decreasing overlayASML NETHERLANDS BV·Filed 2004·Granted Jul 3, 2007·10 cites·13 claims
- 1867US8797504B2Lithographic apparatus and device manufacturing methodNIENHUYS HAN-KWANG·Filed 2012·Granted Aug 5, 2014·1 cites·19 claims
- 1964US8351022B2Radiation beam modification apparatus and methodASML NETHERLANDS BV·Filed 2010·Granted Jan 8, 2013·1 cites·19 claims
- 2064US2025277750A1Contamination measurementASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2163US2025306480A1Contamination determinationASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2262US6955074B2Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Oct 18, 2005·7 cites·27 claims
- 2361US10935895B2Lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Mar 2, 2021·0 cites·21 claims
- 2461US10866527B2Methods and apparatus for monitoring a lithographic manufacturing processASML NETHERLANDS BV·Filed 2018·Granted Dec 15, 2020·0 cites·20 claims
- 2559US7170580B2Lithographic apparatus, projection system, method of projecting and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jan 30, 2007·5 cites·18 claims
- 2658US2024280909A1Deformable mirror systemASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2757US8289498B2Lithographic apparatus and device manufacturing methodLOOPSTRA ERIK ROELOF·Filed 2009·Granted Oct 16, 2012·1 cites·8 claims
- 2857US6730920B2Abbe arm calibration system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2001·Granted May 4, 2004·10 cites·20 claims
- 2953US8477287B2Device manufacturing method, lithographic apparatus and a computer programOUDSHOORN ALEX·Filed 2008·Granted Jul 2, 2013·1 cites·15 claims
- 3044US2016035605A1Support Structure, Method of Controlling the Temperature Of The Same, and Apparatuses Including the SameASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 3141US2004184018A1Abbe arm calibration system for use in lithographic apparatusASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 3238US2007002295A1System and method of monitoring and diagnosing system condition and performanceASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 3336US2012078561A1Method for Calibrating a Target Surface of a Position Measurement System, Position Measurement System, and Lithographic ApparatusKNIJN PAULUS JOHANNES·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →