Inventor · disambiguated record
Naohiro Shimizu
Also filed as: SHIMIZU NAOHIRO
16 granted patents·6 pending applications·247 citations·filing 1994–2020
91Inventor score
Files withNGK INSULATORS LTD10SHIMIZU NAOHIRO3TOKYO INST TECH2TOYO ELECTRIC MFG CO LTD2NEXTY ELECTRONICS CORP1
Top patents by PatentIndex Score
22 records- 0194US5418376AStatic induction semiconductor device with a distributed main electrode structure and static induction semiconductor device with a static induction main electrode shorted structureTOYO ELECTRIC MFG CO LTD·Filed 1994·Granted May 23, 1995·134 cites·20 claims
- 0293US8418668B2Plasma igniter and ignition device for internal combustion engineSHIMIZU NAOHIRO·Filed 2010·Granted Apr 16, 2013·16 cites·8 claims
- 0381US11955513B2Semiconductor deviceNISSHINBO MICRO DEVICES INC·Filed 2020·Granted Apr 9, 2024·1 cites·5 claims
- 0477US6767434B1Method of treating substance and apparatus for carrying out the sameNGK INSULATORS LTD·Filed 2000·Granted Jul 27, 2004·17 cites·11 claims
- 0577US5545905AStatic induction semiconductor device with a static induction schottky shorted structureTOYO ELECTRIC MFG CO LTD·Filed 1994·Granted Aug 13, 1996·43 cites·16 claims
- 0662US5682044AReverse conducting thyristor with a planar-gate, buried-gate, or recessed-gate structureTAMAMUSHI TAKASHIGE·Filed 1996·Granted Oct 28, 1997·31 cites·19 claims
- 0761US9048281B2Semiconductor device and method for producing the sameNGK INSULATORS LTD·Filed 2013·Granted Jun 2, 2015·1 cites·14 claims
- 0860US7332749B2Junction-gate type static induction thyristor and high-voltage pulse generator using such junction-gate type static induction thyristorNGK INSULATORS LTD·Filed 2005·Granted Feb 19, 2008·2 cites·4 claims
- 0951US2010221155A1Sterilization/Aseptization ApparatusNGK INSULATORS LTD·Filed 2006·Application pending·0 cites
- 1051US2008245478A1Surface treatment apparatusTOKYO INST TECH·Filed 2008·Application pending·0 cites
- 1150US2008159925A1Plasma processing apparatusNGK INSULATORS LTD·Filed 2007·Application pending·0 cites
- 1249US2008193330A1surface treatment apparatusTOKYO INST TECH·Filed 2007·Application pending·0 cites
- 1345US8241580B2Plasma processing methods for inactivating toxinsSHIMIZU NAOHIRO·Filed 2011·Granted Aug 14, 2012·0 cites·13 claims
- 1444US9415127B2Plasma treatment methodNGK INSULATORS LTD·Filed 2015·Granted Aug 16, 2016·0 cites·14 claims
- 1541US6558996B1Edge structure for relaxing electric field of semiconductor device having an embedded type diffusion structureNGK INSULATORS INC·Filed 2000·Granted May 6, 2003·1 cites·4 claims
- 1641US6403988B2Semiconductor device with reverse conducting facultyNGK INSULATORS LTD·Filed 2001·Granted Jun 11, 2002·1 cites·21 claims
- 1740US9159820B2Buried gate static induction thyristorNGK INSULATORS LTD·Filed 2012·Granted Oct 13, 2015·0 cites·11 claims
- 1839US11876575B2Electric field communication systemNEXTY ELECTRONICS CORP·Filed 2020·Granted Jan 16, 2024·0 cites·17 claims
- 1939US2013161690A1Semiconductor deviceNGK INSULATORS LTD·Filed 2012·Application pending·0 cites
- 2038US2010329940A1Plasma reactorNGK INSULATORS LTD·Filed 2010·Application pending·0 cites
- 2130US8545765B2Plasma treating apparatusSHIONOYA WATARU·Filed 2012·Granted Oct 1, 2013·0 cites·13 claims
- 2229US8454899B2Gas reforming deviceSHIMIZU NAOHIRO·Filed 2011·Granted Jun 4, 2013·0 cites·6 claims
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