Inventor · disambiguated record
Hirotoshi Kamata
Also filed as: KAMATA HIROTOSHI
13 granted patents·11 pending applications·208 citations·filing 1997–2014
92Inventor score
Files withSHOWA DENKO KK14KAMATA HIROTOSHI3SHOWA HIGHPOLYMER3ENIKOLOPOV INST OF SYNTH POLY1SAKATA YUKO1
Top patents by PatentIndex Score
24 records- 0192US6110987APhotocurable composition and curing process thereforSHOWA DENKO KK·Filed 1997·Granted Aug 29, 2000·53 cites·10 claims
- 0280US6486225B1Photocurable compositionSHOWA DENKO KK·Filed 1999·Granted Nov 26, 2002·35 cites·12 claims
- 0376US7341828B2Thiol compound, photopolymerization initiator composition and photosensitive compositionSHOWA DENKO KK·Filed 2003·Granted Mar 11, 2008·15 cites·24 claims
- 0474US6207726B1Photocurable prepreg composition and production method thereofSHOWA DENKO KK·Filed 1999·Granted Mar 27, 2001·33 cites·7 claims
- 0573US7659413B2(Meth) acryloyl group-containing oxetane compound and production method thereofSHOWA DENKO KK·Filed 2005·Granted Feb 9, 2010·1 cites·6 claims
- 0671US6171700B1Curable composite material composition and curing process thereforSHOWA DENKO KK·Filed 1997·Granted Jan 9, 2001·23 cites·12 claims
- 0770US7622613B2Thiol compound and photosensitive composition using the sameSHOWA DENKO KK·Filed 2005·Granted Nov 24, 2009·1 cites·3 claims
- 0866US6329442B1Curable composite material composition and curing process thereforSHOWA DENKO KK·Filed 2000·Granted Dec 11, 2001·10 cites·12 claims
- 0959US6211260B1Photocurable paint composition for road markingsSHOWA DENKO KK·Filed 1998·Granted Apr 3, 2001·19 cites·7 claims
- 1055US7714032B2Thiol compound and photosensitive composition using the sameSHOWA DENKO KK·Filed 2008·Granted May 11, 2010·0 cites·15 claims
- 1155US2009274916A1Phosphorus-containing benzoxazine compound, process for production thereof, curable resin composition, cured article, and laminate plateSHOWA HIGHPOLYMER·Filed 2007·Application pending·0 cites
- 1252US6316089B1Photocurable prepreg sheet for waterproofing, method and apparatus for production of prepreg sheet, and waterproofing method using the sheetSHOWA DENKO KK·Filed 1998·Granted Nov 13, 2001·13 cites·8 claims
- 1350US2016096964A1Flaky graphite containing boron and production method thereforSHOWA DENKO KK·Filed 2014·Application pending·0 cites
- 1449US2009280331A1Phosphorus-containing benzoxazine compound, process for production thereof, curable resin composition, cured article, and laminate plateSHOWA HIGHPOLYMER·Filed 2007·Application pending·0 cites
- 1544US2008227946A1Thermosetting Composition and Curing Method ThereofSHOWA DENKO KK·Filed 2005·Application pending·0 cites
- 1640US2010298506A1Method for producing an amino group-containing phosphate compound, and a flame-retardant resin and flame-retardant resin compositionSHOWA HIGHPOLYMER·Filed 2006·Application pending·0 cites
- 1739US7569327B2Curable polymer compoundSHOWDA DENKO K K·Filed 2004·Granted Aug 4, 2009·0 cites·30 claims
- 1836US2009105395A1Curable resin compositionENIKOLOPOV INST OF SYNTH POLY·Filed 2007·Application pending·0 cites
- 1935US6165686APhotocurable composition and color reversion preventing methodSHOWA DENKO KK·Filed 1998·Granted Dec 26, 2000·5 cites·8 claims
- 2034US2007141507A1Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereofSAKATA YUKO·Filed 2004·Application pending·0 cites
- 2133US2006079593A1Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the sameKAMATA HIROTOSHI·Filed 2003·Application pending·0 cites
- 2232US2004157140A1Photosensitive coloring composition, color filter using the composition and method of producing the sameFiled 2002·Application pending·0 cites
- 2331US2006041053A1Color filter black matrix resist composition and carbon black dispersion composition used for the compositionKAMATA HIROTOSHI·Filed 2003·Application pending·0 cites
- 2431US2006036023A1Color filter black matrix resist compositionKAMATA HIROTOSHI·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →