Inventor · disambiguated record
Taiga Uno
Also filed as: UNO TAIGA
13 granted patents·5 pending applications·287 citations·filing 1996–2019
90Inventor score
Top patents by PatentIndex Score
18 records- 0196US6243855B1Mask data design methodTOSHIBA KK·Filed 1998·Granted Jun 5, 2001·210 cites·18 claims
- 0290US8039177B2Method of correcting a flare and computer program productTOSHIBA KK·Filed 2010·Granted Oct 18, 2011·9 cites·20 claims
- 0380US8443311B2Flare value calculation method, flare correction method, and computer program productARISAWA YUKIYASU·Filed 2011·Granted May 14, 2013·5 cites·19 claims
- 0480US6004701AMethod for designing Levenson photomaskTOSHIBA KK·Filed 1998·Granted Dec 21, 1999·45 cites·28 claims
- 0579US8527914B2Flare map calculating method and recording mediumUNO TAIGA·Filed 2012·Granted Sep 3, 2013·3 cites·20 claims
- 0665US6622297B2Pattern correcting method and pattern verifying methodTOSHIBA KK·Filed 2001·Granted Sep 16, 2003·8 cites·14 claims
- 0763US8617773B2Method of correcting mask pattern, computer program product, and method of manufacturing semiconductor deviceUNO TAIGA·Filed 2011·Granted Dec 31, 2013·1 cites·14 claims
- 0859US9257367B2Integrated circuit device, method for producing mask layout, and program for producing mask layoutTOSHIBA KK·Filed 2013·Granted Feb 9, 2016·1 cites·9 claims
- 0949US2010166289A1Feature-quantity extracting method, designed-circuit-pattern verifying method, and computer program productSATAKE MASAKI·Filed 2009·Application pending·0 cites
- 1048US10852648B2Mask pattern correction system, and semiconductor device manufacturing method utilizing said correction systemTOSHIBA MEMORY CORP·Filed 2019·Granted Dec 1, 2020·0 cites·18 claims
- 1148US8507160B2Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable mediumUNO TAIGA·Filed 2011·Granted Aug 13, 2013·0 cites·11 claims
- 1246US2010030545A1Pattern shape predicting method and pattern shape predicting apparatusUNO TAIGA·Filed 2009·Application pending·0 cites
- 1343US9268208B2Pattern generating method, pattern forming method, and pattern generating programABURADA RYOTA·Filed 2012·Granted Feb 23, 2016·0 cites·6 claims
- 1443US8196071B2Creating mask data of integrated circuit patterns using calculated etching conversion differenceMASHITA HIROMITSU·Filed 2010·Granted Jun 5, 2012·0 cites·20 claims
- 1543US2015070681A1Pattern generating method, pattern forming method, and pattern generating programTOSHIBA KK·Filed 2014·Application pending·0 cites
- 1637US5795683AMethod and a system for designing a photomask for use in manufacture of a semiconductor deviceTOSHIBA KK·Filed 1996·Granted Aug 18, 1998·5 cites·32 claims
- 1735US2011262867A1Method of creating an evaluation map, system, method of manufacturing a semiconductor device and computer program productUNO TAIGA·Filed 2011·Application pending·0 cites
- 1834US2011047518A1Pattern determining methodAIBA ISSUI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →