Inventor · disambiguated record
Masaru Izawa
Also filed as: IZAWA MASARU
76 granted patents·42 pending applications·612 citations·filing 1996–2025
99Inventor score
Files withHITACHI HIGH TECH CORP41HITACHI LTD23KOBAYASHI HIROYUKI19TANDOU TAKUMI7SUMITOMO METAL IND4
Top patents by PatentIndex Score
118 records- 0198US11978612B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted May 7, 2024·3 cites·16 claims
- 0297US8397668B2Plasma processing apparatusKOBAYASHI HIROYUKI·Filed 2009·Granted Mar 19, 2013·43 cites·6 claims
- 0393US7666266B2Surface conditioning prior to chemical conversion treatment of a steel memberSUMITOMO METAL IND·Filed 2006·Granted Feb 23, 2010·86 cites·1 claims
- 0492US7662232B2Plasma processing apparatusHITACHI LTD·Filed 2007·Granted Feb 16, 2010·14 cites·3 claims
- 0591US2025357080A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 0690US6607988B2Manufacturing method of semiconductor integrated circuit deviceHITACHI LTD·Filed 2000·Granted Aug 19, 2003·53 cites·10 claims
- 0789US11424105B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 23, 2022·3 cites·13 claims
- 0889US8733282B2Plasma processing apparatusKOBAYASHI HIROYUKI·Filed 2013·Granted May 27, 2014·6 cites·6 claims
- 0989US6551445B1Plasma processing system and method for manufacturing a semiconductor device by using the sameHITACHI LTD·Filed 2000·Granted Apr 22, 2003·50 cites·32 claims
- 1088US10217611B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 26, 2019·4 cites·2 claims
- 1188US9038567B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted May 26, 2015·5 cites·7 claims
- 1288US8955579B2Plasma processing apparatus and plasma processing methodTANDOU TAKUMI·Filed 2011·Granted Feb 17, 2015·8 cites·5 claims
- 1388US8142567B2Vacuum processing apparatusKOBAYASHI HIROYUKI·Filed 2009·Granted Mar 27, 2012·16 cites·10 claims
- 1487US8491751B2Plasma processing apparatusKOBAYASHI HIROYUKI·Filed 2012·Granted Jul 23, 2013·5 cites·5 claims
- 1587US6842658B2Method of manufacturing a semiconductor device and manufacturing systemHITACHI LTD·Filed 2001·Granted Jan 11, 2005·40 cites·6 claims
- 1686US12444572B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2024·Granted Oct 14, 2025·0 cites·7 claims
- 1786US6506674B2Method of manufacturing a semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Jan 14, 2003·37 cites·35 claims
- 1884US11915951B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Feb 27, 2024·1 cites·5 claims
- 1984US10665516B2Etching method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted May 26, 2020·3 cites·8 claims
- 2084US7767054B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 3, 2010·9 cites·12 claims
- 2183US10325781B2Etching method and etching apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 18, 2019·3 cites·12 claims
- 2283US7720632B2Dimension measuring apparatus and dimension measuring method for semiconductor deviceHITACHI LTD·Filed 2008·Granted May 18, 2010·8 cites·15 claims
- 2381US7723235B2Method for smoothing a resist pattern prior to etching a layer using the resist patternRENESAS TECH CORP·Filed 2005·Granted May 25, 2010·7 cites·10 claims
- 2480US6677244B2Specimen surface processing methodHITACHI LTD·Filed 2002·Granted Jan 13, 2004·18 cites·4 claims
- 2580US6475918B1Plasma treatment apparatus and plasma treatment methodHITACHI LTD·Filed 2000·Granted Nov 5, 2002·24 cites·21 claims
- 2679US11217454B2Plasma processing method and etching apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jan 4, 2022·2 cites·4 claims
- 2776US10132207B2Variable valve mechanism for internal combustion engineHONDA MOTOR CO LTD·Filed 2017·Granted Nov 20, 2018·1 cites·7 claims
- 2876US8833089B2Plasma processing apparatus and maintenance method thereforTANDOU TAKUMI·Filed 2009·Granted Sep 16, 2014·4 cites·17 claims
- 2976US7915055B2Manufacturing method of semiconductor deviceHITACHI LTD·Filed 2007·Granted Mar 29, 2011·5 cites·10 claims
- 3074US6645870B2Process for fabricating semiconductor deviceHITACHI LTD·Filed 2001·Granted Nov 11, 2003·16 cites·14 claims
- 3173US10090160B2Dry etching apparatus and methodHITACHI HIGH TECH CORP·Filed 2016·Granted Oct 2, 2018·2 cites·3 claims
- 3273US9490104B2Heat treatment apparatusYOKOGAWA KEN'ETSU·Filed 2012·Granted Nov 8, 2016·3 cites·5 claims
- 3373US7838792B2Plasma processing apparatus capable of adjusting temperature of sample standHITACHI HIGH TECH CORP·Filed 2006·Granted Nov 23, 2010·4 cites·3 claims
- 3472US11682542B2Plasma processing deviceHITACHI HIGH TECH CORP·Filed 2021·Granted Jun 20, 2023·0 cites·9 claims
- 3572US11515167B2Plasma etching method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Nov 29, 2022·1 cites·14 claims
- 3672US6673685B2Method of manufacturing semiconductor devicesHITACHI LTD·Filed 2002·Granted Jan 6, 2004·15 cites·4 claims
- 3771US10930476B2Plasma processing deviceHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 23, 2021·1 cites·8 claims
- 3871US9070724B2Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stageTANDOU TAKUMI·Filed 2012·Granted Jun 30, 2015·2 cites·2 claims
- 3971US8632688B2Plasma processing apparatus and plasma processing methodIZAWA MASARU·Filed 2011·Granted Jan 21, 2014·3 cites·4 claims
- 4071US6629538B2Method for cleaning semiconductor wafers in a vacuum environmentHITACHI LTD·Filed 2001·Granted Oct 7, 2003·14 cites·18 claims
- 4170US11557463B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2021·Granted Jan 17, 2023·0 cites·10 claims
- 4270US8349127B2Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stageHITACHI HIGH TECH CORP·Filed 2010·Granted Jan 8, 2013·2 cites·4 claims
- 4369US11842885B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Dec 12, 2023·0 cites·4 claims
- 4469US10872779B2Plasma etching method and plasma etching apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 22, 2020·1 cites·13 claims
- 4566US6643893B2Apparatus for cleaning semiconductor wafers in a vacuum environmentHITACHI LTD·Filed 2001·Granted Nov 11, 2003·10 cites·25 claims
- 4664US8034181B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Oct 11, 2011·2 cites·16 claims
- 4764US6784109B2Method for fabricating semiconductor devices including wiring forming with a porous low-k film and copperHITACHI LTD·Filed 2001·Granted Aug 31, 2004·9 cites·11 claims
- 4864US2011100555A1Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle ContaminationKOBAYASHI HIROYUKI·Filed 2011·Application pending·0 cites
- 4964US2008017318A1Semiconductor device manufacturing apparatus capable of reducing particle contaminationKOBAYASHI HIROYUKI·Filed 2007·Application pending·0 cites
- 5064US2009294060A1Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle ContaminationKOBAYASHI HIROYUKI·Filed 2009·Application pending·0 cites
Showing the top 50 of 118 patent records by PatentIndex Score.
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