Inventor · disambiguated record
Satyendra Sethi
Also filed as: SETHI SATYENDRA · SETHI SATYENDRA S
14 granted patents·577 citations·filing 1993–2001
94Inventor score
Files withVLSI TECHNOLOGY INC8KONINKL PHILIPS ELECTRONICS NV2NAT SEMICONDUCTOR CORP1PHILIP SEMICONDUCTORS INC1VLSI TECHNOLOGY1
Top patents by PatentIndex Score
14 records- 0196US6297170B1Sacrificial multilayer anti-reflective coating for mos gate formationVLSI TECHNOLOGY INC·Filed 1998·Granted Oct 2, 2001·240 cites·30 claims
- 0289US5883011AMethod of removing an inorganic antireflective coating from a semiconductor substrateVLSI TECHNOLOGY INC·Filed 1997·Granted Mar 16, 1999·105 cites·21 claims
- 0386US5776821AMethod for forming a reduced width gate electrodeVLSI TECHNOLOGY INC·Filed 1997·Granted Jul 7, 1998·80 cites·26 claims
- 0479US5443941APlasma polymer antireflective coatingNAT SEMICONDUCTOR CORP·Filed 1993·Granted Aug 22, 1995·42 cites·10 claims
- 0566US6433854B2Method of illumination uniformity in photolithographic systemsKONINKL PHILIPS ELECTRONICS NV·Filed 2001·Granted Aug 13, 2002·7 cites·16 claims
- 0664US5952135AMethod for alignment using multiple wavelengths of lightVLSI TECHNOLOGY·Filed 1997·Granted Sep 14, 1999·23 cites·19 claims
- 0763US5852497AMethod and apparatus for detecting edges under an opaque layerVLSI TECHNOLOGY INC·Filed 1997·Granted Dec 22, 1998·18 cites·11 claims
- 0857US6313542B1Method and apparatus for detecting edges under an opaque layerVLSI TECHNOLOGY INC·Filed 1998·Granted Nov 6, 2001·14 cites·6 claims
- 0954US6411367B1Modified optics for imaging of lens limited subresolution featuresVLSI TECHNOLOGY INC·Filed 1999·Granted Jun 25, 2002·14 cites·20 claims
- 1050US6262795B1Apparatus and method for the improvement of illumination uniformity in photolithographic systemsPHILIP SEMICONDUCTORS INC·Filed 1998·Granted Jul 17, 2001·12 cites·25 claims
- 1149US6372522B1Use of optimized film stacks for increasing absorption for laser repair of fuse linksVLSI TECHNOLOGY INC·Filed 2000·Granted Apr 16, 2002·3 cites·6 claims
- 1247US6642529B1Methods for the automated testing of reticle feature geometriesKONINKL PHILIPS ELECTRONICS NV·Filed 2000·Granted Nov 4, 2003·5 cites·31 claims
- 1346US6215129B1Via alignment, etch completion, and critical dimension measurement method and structureVSLI TECHNOLOGY INC·Filed 1997·Granted Apr 10, 2001·11 cites·6 claims
- 1433US6162650AVia alignment, etch completion, and critical dimension measurement method and structureVLSI TECHNOLOGY INC·Filed 1998·Granted Dec 19, 2000·3 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →