Inventor · disambiguated record
Walter Schoenleber
Also filed as: SCHOENLEBER WALTER
8 granted patents·1 pending application·589 citations·filing 1998–2004
91Inventor score
Files withAPPLIED MATERIALS INC9
Top patents by PatentIndex Score
9 records- 0198US7018271B2Method for monitoring a substrate during chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2004·Granted Mar 28, 2006·127 cites·14 claims
- 0298US6159073AMethod and apparatus for measuring substrate layer thickness during chemical mechanical polishingAPPLIED MATERIALS INC·Filed 1998·Granted Dec 12, 2000·233 cites·28 claims
- 0394US6524165B1Method and apparatus for measuring substrate layer thickness during chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2000·Granted Feb 25, 2003·39 cites·17 claims
- 0494US6247998B1Method and apparatus for determining substrate layer thickness during chemical mechanical polishingAPPLIED MATERIALS INC·Filed 1999·Granted Jun 19, 2001·124 cites·50 claims
- 0581US7086929B2Endpoint detection with multiple light beamsAPPLIED MATERIALS INC·Filed 2003·Granted Aug 8, 2006·21 cites·17 claims
- 0672US6764380B2Method and apparatus for measuring substrate layer thickness during chemical mechanical polishingAPPLIED MATERIALS INC·Filed 2003·Granted Jul 20, 2004·11 cites·8 claims
- 0761US6986699B2Method and apparatus for determining polishing endpoint with multiple light sourcesAPPLIED MATERIALS INC·Filed 2001·Granted Jan 17, 2006·7 cites·36 claims
- 0860US6221784B1Method and apparatus for sequentially etching a wafer using anisotropic and isotropic etchingAPPLIED MATERIALS INC·Filed 1999·Granted Apr 24, 2001·27 cites·24 claims
- 0933US2004224524A1Maintaining the dimensions of features being etched on a lithographic maskAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
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