Inventor · disambiguated record
Hajime Kakumaru
Also filed as: KAKUMARU HAJIME
14 granted patents·1 pending application·186 citations·filing 1977–2002
93Inventor score
Top patents by PatentIndex Score
15 records- 0186US4312916AProcess for producing adhesive filmHITACHI CHEMICAL CO LTD·Filed 1980·Granted Jan 26, 1982·45 cites·7 claims
- 0284US5858616APhotosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the sameHITACHI CHEMICAL CO LTD·Filed 1996·Granted Jan 12, 1999·35 cites·4 claims
- 0377US4562142AAqueous alkali developable photosensitive composition and photosensitive laminateHITACHI CHEMICAL CO LTD·Filed 1984·Granted Dec 31, 1985·23 cites·11 claims
- 0467US4985564AAcridine compound and photopolymerizable composition using the sameHITACHI CHEMICAL CO LTD·Filed 1989·Granted Jan 15, 1991·6 cites·9 claims
- 0558US5089377APhotopolymerizable composition and processes using acridine photoinitiatorsASAHI DENKA KOGYO KK·Filed 1990·Granted Feb 18, 1992·5 cites·6 claims
- 0654US4272607APhotosensitive resin compositionHITACHI CHEMICAL CO LTD·Filed 1977·Granted Jun 9, 1981·12 cites·23 claims
- 0753US6329111B1Phosphor pattern, processes for preparing the same and photosensitive element to be used for the sameHITACHI CHEMICAL CO LTD·Filed 1997·Granted Dec 11, 2001·8 cites·20 claims
- 0850US5403698ANegative type photosensitive electrodepositing resin compositionHITACHI CHEMICAL CO LTD·Filed 1991·Granted Apr 4, 1995·13 cites·13 claims
- 0949US6416931B2Photosensitive element for preparing a phosphor patternHITACHI CHEMICAL CO LTD·Filed 2001·Granted Jul 9, 2002·1 cites·7 claims
- 1047US5700629ADeveloping processHITACHI CHEMICAL CO LTD·Filed 1996·Granted Dec 23, 1997·10 cites·18 claims
- 1147US5334484APhotopolymerizable composition and photopolymerizable elementHITACHI CHEMICAL CO LTD·Filed 1991·Granted Aug 2, 1994·11 cites·3 claims
- 1245US5045433ASubstituted acridine derivatives and application thereofHITACHI CHEMICAL CO LTD·Filed 1990·Granted Sep 3, 1991·8 cites·3 claims
- 1344US6077647APhotosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the sameHITACHI CHEMICAL CO LTD·Filed 1998·Granted Jun 20, 2000·6 cites·10 claims
- 1441US6248501B1Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the sameHITACHI CHEMICAL CO LTD·Filed 2000·Granted Jun 19, 2001·3 cites·18 claims
- 1540US2003090193A1Phosphor pattern, processes for preparing the same and photosensitive element to be used for the sameFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →